Issued Patents All Time
Showing 101–125 of 222 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10224180 | Chamber with flow-through source | — | 2019-03-05 |
| 10214815 | Surface treated aluminum nitride baffle | Muhammad M. Rasheed | 2019-02-26 |
| 10177050 | Methods and apparatus for controlling substrate uniformity | S. M. Reza Sadjadi, Hamid Noorbakhsh, John Zheng Ye, David H. Quach, Sean S. Kang | 2019-01-08 |
| 10170282 | Insulated semiconductor faceplate designs | Xinglong Chen, Shankar Venkataraman | 2019-01-01 |
| 10153133 | Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion | Satoru Kobayashi, Hideo Sugai, Soonam Park, Kartik Ramaswamy | 2018-12-11 |
| 10147620 | Bolted wafer chuck thermal management systems and methods for wafer processing systems | David Benjaminson, Ananda Seelavanth Math, Saravanakumar Natarajan, Shubham Chourey | 2018-12-04 |
| 10096496 | Process chamber for etching low K and other dielectric films | Srinivas D. Nemani, Ellie Yieh, Sergey G. Belostotskiy | 2018-10-09 |
| 10062585 | Oxygen compatible plasma source | — | 2018-08-28 |
| 10020170 | Chemistry compatible coating material for advanced device on-wafer particle performance | Jennifer Y. Sun, Biraja P. Kanungo | 2018-07-10 |
| 10010912 | Particle reduction via throttle gate valve purge | Jared Ahmad Lee, Martin Jeff Salinas, Andrew Nguyen, Tom K. Cho, Eric A. Englhardt +1 more | 2018-07-03 |
| 10008366 | Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing | Sang Won Kang, Nicholas Celeste, Peter M. Hillman, Douglas B. Hayden, Dongqing Yang | 2018-06-26 |
| 9991134 | Processing systems and methods for halide scavenging | Anchuan Wang, Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen +5 more | 2018-06-05 |
| 9978564 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Soonam Park, Jang-Gyoo Yang +4 more | 2018-05-22 |
| 9975758 | Wafer processing equipment having exposable sensing layers | Leonard Tedeschi, Lili Ji, Olivier Joubert, Philip Allan Kraus, Daniel T. McCormick | 2018-05-22 |
| 9972477 | Multiple point gas delivery apparatus for etching materials | Tien Fak Tan | 2018-05-15 |
| 9966240 | Systems and methods for internal surface conditioning assessment in plasma processing equipment | Soonam Park, Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Jiayin Huang | 2018-05-08 |
| 9948214 | High temperature electrostatic chuck with real-time heat zone regulating capability | Jennifer Y. Sun, Sehn Thach, Xing Lin, Michael D. Willwerth, Konstantin Makhratchev | 2018-04-17 |
| 9947559 | Thermal management of edge ring in semiconductor processing | Aniruddha Pal, Martin Jeffrey Salinas, Imad Yousif, Andrew Nguyen | 2018-04-17 |
| 9934942 | Chamber with flow-through source | — | 2018-04-03 |
| 9922840 | Adjustable remote dissociation | Soonam Park, Kenneth D. Schatz, Soonwook Jung | 2018-03-20 |
| 9903020 | Generation of compact alumina passivation layers on aluminum plasma equipment components | Sung Je Kim, Laksheswar Kalita, Yogita Pareek, Ankur Kadam, Prerna Goradia +1 more | 2018-02-27 |
| 9892888 | Particle generation suppresor by DC bias modulation | Jonghoon Baek, Soonam Park, Xinglong Chen | 2018-02-13 |
| 9885117 | Conditioned semiconductor system parts | Sung Je Kim | 2018-02-06 |
| 9874524 | In-situ spatially resolved plasma monitoring by using optical emission spectroscopy | Tae Seung Cho, Junghoon Kim, Soonwook Jung, Soonam Park | 2018-01-23 |
| 9846130 | Ceramic ring test device | Satoru Kobayashi, Yufei Zhu, Saurabh Garg, Soonam Park | 2017-12-19 |