Issued Patents All Time
Showing 25 most recent of 223 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12431360 | Selective etching between silicon-and-germanium-containing materials with varying germanium concentrations | Jiayin Huang, Zihui Li, Anchuan Wang | 2025-09-30 |
| 12406832 | Semiconductor chamber components with advanced dual layer nickel-containing coatings | Laksheswar Kalita, Nilesh Mistry, Jonathan Strahle, Christopher Laurent Beaudry, Lok Kee Loh | 2025-09-02 |
| 12394631 | Selective etching of silicon-and-germanium-containing materials with increased surface purities | Jiayin Huang, Zihui Li, Yi Jin, Anchuan Wang | 2025-08-19 |
| 12381086 | Low temperature graphene growth | Jialiang Wang, Susmit Singha Roy, Abhijit Basu Mallick | 2025-08-05 |
| 12374584 | Multi color stack for self aligned dual pattern formation for multi purpose device structures | Suketu Arun Parikh, Martin Jay Seamons, Jingmei Liang, Shuchi Sunil Ojha, Tom Choi +1 more | 2025-07-29 |
| 12315735 | Methods for removing etch stop layers | Suketu Arun Parikh, Andrew W. Yeoh, Tom Choi, Joung Joo Lee | 2025-05-27 |
| 12315736 | Methods of highly selective silicon oxide removal | Lala Zhu, Shi Che, Dongqing Yang | 2025-05-27 |
| 12203171 | Batch curing chamber with gas distribution and individual pumping | Adib Khan, Shankar Venkataraman, Jay D. Pinson, II, Jang-Gyoo Yang, Qiwei Liang | 2025-01-21 |
| 12142534 | Replacement contact process | Sankuei Lin, Ajay Bhatnagar | 2024-11-12 |
| 11830729 | Low-k boron carbonitride films | Zeqing Shen, Bo Qi, Abhijit Basu Mallick | 2023-11-28 |
| 11818877 | Three-dimensional dynamic random access memory (DRAM) and methods of forming the same | Chang-Seok Kang, Tomohiko Kitajima, Sung-Kwan Kang, Fredrick Fishburn, Gill Yong Lee | 2023-11-14 |
| 11791155 | Diffusion barriers for germanium | Huiyuan Wang, Susmit Singha Roy, Takehito Koshizawa, Bo Qi, Abhijit Basu Mallick | 2023-10-17 |
| 11735467 | Airgap formation processes | Ashish Pal, Gaurav Thareja, Sankuei Lin, Ching-Mei Hsu, Ajay Bhatnagar +1 more | 2023-08-22 |
| 11732352 | Hydrogen free silicon dioxide | Zeqing Shen, Bo Qi, Abhijit Basu Mallick | 2023-08-22 |
| 11696433 | 3D pitch multiplication | Fredrick Fishburn | 2023-07-04 |
| 11587930 | 3-D DRAM structures and methods of manufacture | Chang-Seok Kang, Tomohiko Kitajima, Sung-Kwan Kang | 2023-02-21 |
| 11515163 | Low temperature graphene growth | Jialiang Wang, Susmit Singha Roy, Abhijit Basu Mallick | 2022-11-29 |
| 11437242 | Selective removal of silicon-containing materials | Jungmin Ko, Kwang Soo Kim, Thomas S. Choi | 2022-09-06 |
| 11408075 | Batch curing chamber with gas distribution and individual pumping | Adib Khan, Shankar Venkataraman, Jay D. Pinson, II, Jang-Gyoo Yang, Qiwei Liang | 2022-08-09 |
| 11355354 | Thermal deposition of doped silicon oxide | Zeqing Shen, Bo Qi, Abhijit Basu Mallick | 2022-06-07 |
| 11328909 | Chamber conditioning and removal processes | Hanshen Zhang, Zhenjiang Cui | 2022-05-10 |
| 11211286 | Airgap formation processes | Ashish Pal, Gaurav Thareja, Sankuei Lin, Ching-Mei Hsu, Ajay Bhatnagar +1 more | 2021-12-28 |
| 11101136 | Process window widening using coated parts in plasma etch processes | Dongqing Yang, Tien Fak Tan, Peter M. Hillman, Lala Zhu, Dmitry Lubomirsky +2 more | 2021-08-24 |
| 11004689 | Thermal silicon etch | Zihui Li, Rui Cheng, Anchuan Wang, Abhijit Basu Mallick | 2021-05-11 |
| 10943834 | Replacement contact process | Sankuei Lin, Ajay Bhatnagar | 2021-03-09 |