Issued Patents All Time
Showing 1–25 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12203171 | Batch curing chamber with gas distribution and individual pumping | Adib Khan, Shankar Venkataraman, Jay D. Pinson, II, Nitin K. Ingle, Qiwei Liang | 2025-01-21 |
| 12146219 | Flow control features of CVD chambers | Kien N. Chuc, Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller +5 more | 2024-11-19 |
| 11408075 | Batch curing chamber with gas distribution and individual pumping | Adib Khan, Shankar Venkataraman, Jay D. Pinson, II, Nitin K. Ingle, Qiwei Liang | 2022-08-09 |
| 11264213 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park +4 more | 2022-03-01 |
| 10550472 | Flow control features of CVD chambers | Kien N. Chuc, Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller +5 more | 2020-02-04 |
| 10354843 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park +4 more | 2019-07-16 |
| 10283321 | Semiconductor processing system and methods using capacitively coupled plasma | Matthew L. Miller, Xinglong Chen, Kien N. Chuc, Qiwei Liang, Shankar Venkataraman +1 more | 2019-05-07 |
| 10113236 | Batch curing chamber with gas distribution and individual pumping | Adib Khan, Shankar Venkataraman, Jay D. Pinson, II, Nitin K. Ingle, Qiwei Liang | 2018-10-30 |
| 10062587 | Pedestal with multi-zone temperature control and multiple purge capabilities | Xinglong Chen, Alexander Tam, Elisha Tam | 2018-08-28 |
| 10056233 | RPS assisted RF plasma source for semiconductor processing | Xinglong Chen, Saurabh Garg | 2018-08-21 |
| 10032606 | Semiconductor processing with DC assisted RF power for improved control | Xinglong Chen, Soonam Park, Jonghoon Baek, Saurabh Garg, Shankar Venkataraman | 2018-07-24 |
| 9978564 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park +4 more | 2018-05-22 |
| 9741545 | RPS assisted RF plasma source for semiconductor processing | Xinglong Chen, Saurabh Garg | 2017-08-22 |
| 9502218 | RPS assisted RF plasma source for semiconductor processing | Xinglong Chen, Saurabh Garg | 2016-11-22 |
| 9384997 | Dry-etch selectivity | He Ren, Jonghoon Baek, Anchuan Wang, Soonam Park, Saurabh Garg +2 more | 2016-07-05 |
| 9373517 | Semiconductor processing with DC assisted RF power for improved control | Xinglong Chen, Soonam Park, Jonghoon Baek, Saurabh Garg, Shankar Venkataraman | 2016-06-21 |
| 9267739 | Pedestal with multi-zone temperature control and multiple purge capabilities | Xinglong Chen, Alexander Tam, Elisha Tam | 2016-02-23 |
| 9144147 | Semiconductor processing system and methods using capacitively coupled plasma | Matthew L. Miller, Xinglong Chen, Kien N. Chuc, Qiwei Liang, Shankar Venkataraman +1 more | 2015-09-22 |
| 9132436 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park +4 more | 2015-09-15 |
| 8969212 | Dry-etch selectivity | He Ren, Jonghoon Baek, Anchuan Wang, Soonam Park, Saurabh Garg +2 more | 2015-03-03 |
| 8894767 | Flow control features of CVD chambers | Kien N. Chuc, Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller +5 more | 2014-11-25 |
| 8771538 | Plasma source design | Dmitry Lubomirsky, Matthew L. Miller, Jay D. Pinson, II, Kien N. Chuc | 2014-07-08 |
| 8742665 | Plasma source design | Dmitry Lubomirsky, Matthew L. Miller, Jay D. Pinson, II, Kien N. Chuc | 2014-06-03 |
| 8357435 | Flowable dielectric equipment and processes | Dmitry Lubomirsky, Qiwei Liang | 2013-01-22 |
| 8329262 | Dielectric film formation using inert gas excitation | Matthew L. Miller | 2012-12-11 |