Issued Patents All Time
Showing 26–36 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8237517 | Apparatus for multiple frequency power application | Steven C. Shannon, Matthew L. Miller, Kartik Ramaswamy, James P. Cruse | 2012-08-07 |
| 7994872 | Apparatus for multiple frequency power application | Steven C. Shannon, Matthew L. Miller, Kartik Ramaswamy, James P. Cruse | 2011-08-09 |
| 7989365 | Remote plasma source seasoning | Soonam Park, Soo Hyun Jeon, Toan Q. Tran, Qiwei Liang, Dmitry Lubomirsky | 2011-08-02 |
| 7972968 | High density plasma gapfill deposition-etch-deposition process etchant | Young S. Lee, Ying Rui, Dmitry Lubomirsky, Daniel J. Hoffman, Anchuan Wang | 2011-07-05 |
| 7955986 | Capacitively coupled plasma reactor with magnetic plasma control | Daniel J. Hoffman, Matthew L. Miller, Heeyeop Chae, Michael Barnes, Tetsuya Ishikawa +1 more | 2011-06-07 |
| 7375947 | Method of feedback control of ESC voltage using wafer voltage measurement at the bias supply output | Daniel J. Hoffman, Steven C. Shannon, Douglas H. Burns, Wonseok Lee, Kwang Soo Kim | 2008-05-20 |
| 7359177 | Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output | Daniel J. Hoffman, Steven C. Shannon, Douglas H. Burns, Wonseok Lee, Kwang Soo Kim | 2008-04-15 |
| 7196283 | Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface | Douglas A. Buchberger, Jr., Daniel J. Hoffman, Olga Regelman, James D. Carducci, Keiji Horioka | 2007-03-27 |
| 7141757 | Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent | Daniel J. Hoffman, Douglas A. Buchberger, Jr., Douglas H. Burns | 2006-11-28 |
| 6900596 | Capacitively coupled plasma reactor with uniform radial distribution of plasma | Daniel J. Hoffman, James D. Carducci, Douglas A. Buchberger, Jr., Matthew L. Miller, Kang-Lie Chiang +2 more | 2005-05-31 |
| 6853141 | Capacitively coupled plasma reactor with magnetic plasma control | Daniel J. Hoffman, Matthew L. Miller, Heeyeop Chae, Michael Barnes, Tetsuya Ishikawa +1 more | 2005-02-08 |