Issued Patents All Time
Showing 25 most recent of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9475710 | Very high frequency (VHF) driven atmospheric plasma sources and point of use fertigation of irrigation water utilizing plasma production of nitrogen bearing species | Detlef Knappe, Brandon Byrns, Daniel Wooten, Alexander D. Lindsay | 2016-10-25 |
| 8435379 | Substrate cleaning chamber and cleaning and conditioning methods | Vineet Haresh Mehta, Karl M. Brown, John Pipitone, Daniel J. Hoffman, Keith A. Miller +1 more | 2013-05-07 |
| 8357264 | Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator | Kartik Ramaswamy, Daniel J. Hoffman, Matthew L. Miller, Kenneth S. Collins | 2013-01-22 |
| 8337661 | Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator | Kartik Ramaswamy, Daniel J. Hoffman, Matthew L. Miller, Kenneth S. Collins | 2012-12-25 |
| 8324525 | Method of plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator | Kartik Ramaswamy, Daniel J. Hoffman, Matthew L. Miller, Kenneth S. Collins | 2012-12-04 |
| 8237517 | Apparatus for multiple frequency power application | Jang-Gyoo Yang, Matthew L. Miller, Kartik Ramaswamy, James P. Cruse | 2012-08-07 |
| 8092605 | Magnetic confinement of a plasma | Masao Drexel, James A. Stinnett, Ying Rui, Ying Xiao, Roger Alan Lindley +1 more | 2012-01-10 |
| 8080479 | Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-12-20 |
| 8076247 | Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-12-13 |
| 8018164 | Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sources | Kartik Ramaswamy, Daniel J. Hoffman, Matthew L. Miller, Kenneth S. Collins | 2011-09-13 |
| 8002945 | Method of plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator | Kartik Ramaswamy, Daniel J. Hoffman, Matthew L. Miller, Kenneth S. Collins | 2011-08-23 |
| 7994872 | Apparatus for multiple frequency power application | Jang-Gyoo Yang, Matthew L. Miller, Kartik Ramaswamy, James P. Cruse | 2011-08-09 |
| 7988815 | Plasma reactor with reduced electrical skew using electrical bypass elements | Shahid Rauf, Kenneth S. Collins, Kallol Bera, Kartik Ramaswamy, Hiroji Hanawa +5 more | 2011-08-02 |
| 7972467 | Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor | Kallol Bera, Yan Ye, James D. Carducci, Daniel J. Hoffman, Douglas A. Buchberger, Jr. | 2011-07-05 |
| 7967944 | Method of plasma load impedance tuning by modulation of an unmatched low power RF generator | Kartik Ramaswamy, Daniel J. Hoffman, Matthew L. Miller, Kenneth S. Collins | 2011-06-28 |
| 7968469 | Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-06-28 |
| 7884025 | Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-02-08 |
| 7879185 | Dual frequency RF match | John Holland | 2011-02-01 |
| 7879731 | Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-02-01 |
| 7848898 | Method for monitoring process drift using plasma characteristics | Daniel J. Hoffman, Jeremiah T. Pender, Tarreg Mawari | 2010-12-07 |
| 7838430 | Plasma control using dual cathode frequency mixing | Dennis S. Grimard, Theodoros Panagopoulos, Daniel J. Hoffman, Michael G. Chafin, Troy S. Detrick +4 more | 2010-11-23 |
| 7812278 | Method for testing plasma reactor multi-frequency impedance match networks | — | 2010-10-12 |
| 7813103 | Time-based wafer de-chucking from an electrostatic chuck having separate RF BIAS and DC chucking electrodes | Michael G. Chafin, Dennis S. Grimard | 2010-10-12 |
| 7780866 | Method of plasma confinement for enhancing magnetic control of plasma radial distribution | Matthew L. Miller, Daniel J. Hoffman, Michael Kutney, James D. Carducci, Andrew Nguyen | 2010-08-24 |
| 7777599 | Methods and apparatus for controlling characteristics of a plasma | Daniel J. Hoffman, Matthew L. Miller, Olga Regelman, Kenneth S. Collins, Kartik Ramaswamy +1 more | 2010-08-17 |