Issued Patents All Time
Showing 26–39 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7754997 | Apparatus and method to confine plasma and reduce flow resistance in a plasma | Kallol Bera, Yan Ye, James D. Carducci, Daniel J. Hoffman, Douglas A. Buchberger, Jr. | 2010-07-13 |
| 7620511 | Method for determining plasma characteristics | Daniel J. Hoffman, Jeremiah T. Pender, Tarreg Mawari | 2009-11-17 |
| 7585384 | Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor | Kallol Bera, Yan Ye, James D. Carducci, Daniel J. Hoffman, Douglas A. Buchberger, Jr. | 2009-09-08 |
| 7554334 | Matching network characterization using variable impedance analysis | Daniel J. Hoffman, Steven Lane, Walter R. Merry, Jivko Dinev | 2009-06-30 |
| 7510665 | Plasma generation and control using dual frequency RF signals | Alexander Paterson, Theodoros Panagopoulos, John Holland, Dennis S. Grimard, Daniel J. Hoffman | 2009-03-31 |
| 7440859 | Method for determining plasma characteristics | Daniel J. Hoffman, Jeremiah T. Pender, Tarreg Mawari | 2008-10-21 |
| 7431857 | Plasma generation and control using a dual frequency RF source | Alex Paterson, Theodoros Panagopoulos, John Holland, Dennis S. Grimard, Yashushi Takakura | 2008-10-07 |
| 7375947 | Method of feedback control of ESC voltage using wafer voltage measurement at the bias supply output | Jang-Gyoo Yang, Daniel J. Hoffman, Douglas H. Burns, Wonseok Lee, Kwang Soo Kim | 2008-05-20 |
| 7359177 | Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output | Jang-Gyoo Yang, Daniel J. Hoffman, Douglas H. Burns, Wonseok Lee, Kwang Soo Kim | 2008-04-15 |
| 7326872 | Multi-frequency dynamic dummy load and method for testing plasma reactor multi-frequency impedance match networks | — | 2008-02-05 |
| 7286948 | Method for determining plasma characteristics | Daniel J. Hoffman, Jeremiah T. Pender, Tarreg Mawari | 2007-10-23 |
| 6879870 | Method and apparatus for routing harmonics in a plasma to ground within a plasma enhanced semiconductor wafer processing chamber | Daniel J. Hoffman, Michael Barnes, Lee LaBlanc | 2005-04-12 |
| 6667577 | Plasma reactor with spoke antenna having a VHF mode with the spokes in phase | Daniel J. Hoffman, Chunshi Cui, Yan Ye, Gerardo Delgadino, Douglas A. Buchberger, Jr. +4 more | 2003-12-23 |
| 6652712 | Inductive antenna for a plasma reactor producing reduced fluorine dissociation | Shiang-Bau Wang, Daniel J. Hoffman, Chunshi Cui, Yan Ye, Gerardo Delgadino +3 more | 2003-11-25 |