| 12460298 |
Showerhead design to control stray deposition |
Akshay Dhanakshirur, Juan Carlos Rocha-Alvarez, Kaushik Alayavalli, Jay D. Pinson, II, Rick Kustra +7 more |
2025-11-04 |
|
| 12228534 |
Capacitive sensor for monitoring gas concentration |
Xiaopu Li, Yaoling Pan, Kelvin Chan, Amir Bayati, Philip Allan Kraus +2 more |
2025-02-18 |
|
| 12224156 |
Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool |
Xiaopu Li, Jozef Kudela, Tsutomu Tanaka, Dmitry A. Dzilno |
2025-02-11 |
|
| 12142458 |
Symmetric plasma source to generate pie-shaped treatment |
Anantha K. Subramani, Farzad Houshmand, Philip Allan Kraus, Abhishek Chowdhury, John C. Forster |
2024-11-12 |
$39,712,000 |
| 12020965 |
Magnetic holding structures for plasma processing applications |
Andrew Nguyen, Sathya Swaroop Ganta, Canfeng Lai |
2024-06-25 |
$57,214,000 |
| 12002654 |
Modular high-frequency source |
Thai Cheng Chua, Christian Amormino, Hanh Nguyen, Philip Allan Kraus |
2024-06-04 |
$68,807,000 |
| 11984302 |
Magnetic-material shield around plasma chambers near pedestal |
Job George Konnoth Joseph, Sathya Swaroop Ganta, Andrew Nguyen, Jay D. Pinson, II, Akshay Dhanakshirur +6 more |
2024-05-14 |
$61,768,000 |
| 11959174 |
Shunt door for magnets in plasma process chamber |
Sathya Swaroop Ganta, Timothy Joseph Franklin, Kaushik Alayavalli, Akshay Dhanakshirur, Stephen C. Garner +1 more |
2024-04-16 |
$82,852,000 |
| 11959868 |
Capacitive sensor for monitoring gas concentration |
Xiaopu Li, Yaoling Pan, Kelvin Chan, Amir Bayati, Philip Allan Kraus +2 more |
2024-04-16 |
$82,852,000 |
| 11908662 |
Device and method for tuning plasma distribution using phase control |
Xiaopu Li, Edward P. Hammond, IV, Jonghoon Baek, Amit Kumar BANSAL, Jun Ma +1 more |
2024-02-20 |
$66,055,000 |
| 11823871 |
Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool |
Jozef Kudela, Tsutomu Tanaka, Alexander V. Garachtchenko, Dmitry A. Dzilno, Avinash Shervegar +3 more |
2023-11-21 |
$39,416,000 |
| 11810810 |
Contour pocket and hybrid susceptor for wafer uniformity |
Kaushal Gangakhedkar, Joseph Yudovsky |
2023-11-07 |
$37,048,000 |
| 11581206 |
Capacitive sensor for chamber condition monitoring |
Yaoling Pan, Patrick Tae, Leonard Tedeschi, Jennifer Y. Sun, Philip Allan Kraus +6 more |
2023-02-14 |
$35,617,000 |
| 11557501 |
Contour pocket and hybrid susceptor for wafer uniformity |
Kaushal Gangakhedkar, Joseph Yudovsky |
2023-01-17 |
$39,427,000 |
| 11315769 |
Plasma source for rotating susceptor |
Anantha K. Subramani, John C. Forster, Philip Allan Kraus, Farzad Houshmand, Hanhong Chen |
2022-04-26 |
$43,127,000 |
| 11315763 |
Shaped electrodes for improved plasma exposure from vertical plasma source |
Dmitry A. Dzilno, Anantha K. Subramani, John C. Forster, Tsutomu Tanaka |
2022-04-26 |
$43,127,000 |
| 11198939 |
Recursive inject apparatus for improved distribution of gas |
Aaron Miller |
2021-12-14 |
$102,368,000 |
| 11189502 |
Showerhead with interlaced gas feed and removal and methods of use |
Shahid Rauf, James D. Carducci, Vladimir Knyazik, Anantha K. Subramani |
2021-11-30 |
$50,552,000 |
| 11114284 |
Plasma reactor with electrode array in ceiling |
Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy, James D. Carducci, Shahid Rauf |
2021-09-07 |
$49,370,000 |
| 11081317 |
Modular high-frequency source |
Thai Cheng Chua, Christian Amormino, Hanh Nguyen, Philip Allan Kraus |
2021-08-03 |
$89,613,000 |
| 10903056 |
Plasma source for rotating susceptor |
Anantha K. Subramani, John C. Forster, Philip Allan Kraus, Farzad Houshmand, Hanhong Chen |
2021-01-26 |
$35,448,000 |
| 10879042 |
Symmetric plasma source to generate pie shaped treatment |
Anantha K. Subramani, Farzad Houshmand, Philip Allan Kraus, Abhishek Chowdhury, John C. Forster |
2020-12-29 |
$47,583,000 |
| 10763085 |
Shaped electrodes for improved plasma exposure from vertical plasma source |
Dmitry A. Dzilno, Anantha K. Subramani, John C. Forster, Tsutomu Tanaka |
2020-09-01 |
$30,946,000 |
| 10685864 |
Contour pocket and hybrid susceptor for wafer uniformity |
Kaushal Gangakhedkar, Joseph Yudovsky |
2020-06-16 |
$36,933,000 |
| 10633741 |
Recursive inject apparatus for improved distribution of gas |
Aaron Miller |
2020-04-28 |
$15,875,000 |
