Issued Patents All Time
Showing 25 most recent of 92 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12334383 | Substrate support gap pumping to prevent glow discharge and light-up | Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy, Silverst Rodrigues, Yang Yang | 2025-06-17 |
| 12191118 | Monolithic modular microwave source with integrated process gas distribution | Richard Fovell, Larry D. Elizaga, Silverst Rodrigues, Vladimir Knyazik, Philip Allan Kraus +1 more | 2025-01-07 |
| 12163218 | Continuous liner for use in a processing chamber | Kenneth S. Collins, Kartik Ramaswamy | 2024-12-10 |
| 12144090 | Monolithic modular microwave source with integrated temperature control | Richard Fovell, Larry D. Elizaga, Silverst Rodrigues, Thai Cheng Chua, Philip Allan Kraus | 2024-11-12 |
| 12033835 | Modular microwave source with multiple metal housings | Philip Allan Kraus, Robert B. Moore, Richard Fovell, Sathya Swaroop Ganta, Karthikeyan Balaraman +1 more | 2024-07-09 |
| 11935724 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, Kenneth S. Collins, Shahid Rauf +3 more | 2024-03-19 |
| 11881384 | Monolithic modular microwave source with integrated process gas distribution | Richard Fovell, Larry D. Elizaga, Silverst Rodrigues, Vladimir Knyazik, Philip Allan Kraus +1 more | 2024-01-23 |
| 11814724 | Continuous liner for use in a processing chamber | Kenneth S. Collins, Kartik Ramaswamy | 2023-11-14 |
| 11670489 | Modular microwave source with embedded ground surface | Joseph AuBuchon, Larry D. Elizaga, Richard Fovell, Philip Allan Kraus, Thai Cheng Chua | 2023-06-06 |
| 11587766 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, Kenneth S. Collins, Shahid Rauf +3 more | 2023-02-21 |
| 11564292 | Monolithic modular microwave source with integrated temperature control | Richard Fovell, Larry D. Elizaga, Silverst Rodrigues, Thai Cheng Chua, Philip Allan Kraus | 2023-01-24 |
| 11499223 | Continuous liner for use in a processing chamber | Kenneth S. Collins, Kartik Ramaswamy | 2022-11-15 |
| 11424104 | Plasma reactor with electrode filaments extending from ceiling | Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy | 2022-08-23 |
| 11355321 | Plasma reactor with electrode assembly for moving substrate | Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy | 2022-06-07 |
| 11315760 | Symmetric plasma process chamber | Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen, Douglas A. Buchberger, Jr. +3 more | 2022-04-26 |
| 11189502 | Showerhead with interlaced gas feed and removal and methods of use | Kallol Bera, Shahid Rauf, Vladimir Knyazik, Anantha K. Subramani | 2021-11-30 |
| 11114284 | Plasma reactor with electrode array in ceiling | Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy, Shahid Rauf, Kallol Bera | 2021-09-07 |
| 11101113 | Ion-ion plasma atomic layer etch process | Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, Leonid Dorf, Yang Yang | 2021-08-24 |
| 11049694 | Modular microwave source with embedded ground surface | Joseph AuBuchon, Larry D. Elizaga, Richard Fovell, Philip Allan Kraus, Thai Cheng Chua | 2021-06-29 |
| 11043361 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, Kenneth S. Collins, Shahid Rauf +3 more | 2021-06-22 |
| 11043360 | Gas distribution plate assembly for high power plasma etch processes | Kenneth S. Collins, Kartik Ramaswamy, Michael R. Rice, Richard Fovell, Vijay D. Parkhe | 2021-06-22 |
| 10811226 | Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates | Kenneth S. Collins, Richard Fovell, Jason A. Kenney, Kartik Ramaswamy, Shahid Rauf | 2020-10-20 |
| 10780447 | Apparatus for controlling temperature uniformity of a showerhead | Richard Fovell, Silverst Rodrigues | 2020-09-22 |
| 10615006 | Symmetric plasma process chamber | Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen, Douglas A. Buchberger, Jr. +3 more | 2020-04-07 |
| 10615004 | Distributed electrode array for plasma processing | Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy, Yue Guo, Olga Regelman | 2020-04-07 |