Issued Patents All Time
Showing 25 most recent of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11894220 | Method and apparatus for controlling a processing reactor | Michael Nichols, Tina Dhekial-Phukan, Venkata Ravishankar Kasibhotla, Sanggyum Kim | 2024-02-06 |
| 11693053 | Bode fingerprinting for characterizations and failure detections in processing chamber | Tao Zhang, Upendra Ummethala | 2023-07-04 |
| 11486927 | Bode fingerprinting for characterizations and failure detections in processing chamber | Tao Zhang, Upendra Ummethala | 2022-11-01 |
| 11315760 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Zhigang Chen, Andrew Nguyen, Douglas A. Buchberger, Jr. +3 more | 2022-04-26 |
| 11049699 | Gas box for CVD chamber | Tejas Ulavi, Amit Kumar BANSAL, Nitin Pathak | 2021-06-29 |
| 10910238 | Heater pedestal assembly for wide range temperature control | Kaushik Alayavalli, Sanjeev Baluja, Amit Kumar BANSAL, Matthew J. Busche, Juan Carlos Rocha-Alvarez +3 more | 2021-02-02 |
| 10770269 | Apparatus and methods for reducing particles in semiconductor process chambers | Andrew Nguyen, Bradley J. Howard, Shahid Rauf, Tom Choi, Kenneth S. Collins +3 more | 2020-09-08 |
| 10612135 | Method and system for high temperature clean | Sanjeev Baluja, Kalyanjit Ghosh, Ren-Guan Duan, Mayur Govind Kulkarni, Gregory Siu +4 more | 2020-04-07 |
| 10615006 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Zhigang Chen, Andrew Nguyen, Douglas A. Buchberger, Jr. +3 more | 2020-04-07 |
| 10580620 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Zhigang Chen, Andrew Nguyen, Douglas A. Buchberger, Jr. +3 more | 2020-03-03 |
| 10546728 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Zhigang Chen, Andrew Nguyen, Douglas A. Buchberger, Jr. +3 more | 2020-01-28 |
| 10535502 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Zhigang Chen, Andrew Nguyen, Douglas A. Buchberger, Jr. +3 more | 2020-01-14 |
| 10453656 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Zhigang Chen, Andrew Nguyen, Douglas A. Buchberger, Jr. +3 more | 2019-10-22 |
| 10131994 | Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow | Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more | 2018-11-20 |
| 9909213 | Recursive pumping for symmetrical gas exhaust to control critical dimension uniformity in plasma reactors | Sergio Fukuda Shoji, Hamid Noorbakhsh, Jong Mun Kim, Jason Della Rosa | 2018-03-06 |
| 9896769 | Inductively coupled plasma source with multiple dielectric windows and window-supporting structure | Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more | 2018-02-20 |
| 9761416 | Apparatus and methods for reducing particles in semiconductor process chambers | Andrew Nguyen, Bradley J. Howard, Shahid Rauf, Tom K. Cho, Kenneth S. Collins +3 more | 2017-09-12 |
| 9745663 | Symmetrical inductively coupled plasma source with symmetrical flow chamber | Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more | 2017-08-29 |
| 9741546 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Zhigang Chen, Andrew Nguyen, Douglas A. Buchberger, Jr. +3 more | 2017-08-22 |
| 9449796 | Plasma processing system including a symmetrical remote plasma source for minimal ion energy | Ankur Agarwal, Rajinder Dhindsa | 2016-09-20 |
| 9269546 | Plasma reactor with electron beam plasma source having a uniform magnetic field | Ming-Feng Wu, Leonid Dorf, Shahid Rauf, Kenneth S. Collins, Nipun Misra | 2016-02-23 |
| 9155134 | Methods and apparatus for rapidly responsive heat control in plasma processing devices | Chunlei Zhang, Richard Fovell, Ezra Robert Gold, James P. Cruse | 2015-10-06 |
| 8980760 | Methods and apparatus for controlling plasma in a process chamber | Ankur Agarwal, Shahid Rauf | 2015-03-17 |
| 8895889 | Methods and apparatus for rapidly responsive heat control in plasma processing devices | Chunlei Zhang, Richard Fovell, Ezra Robert Gold, James P. Cruse | 2014-11-25 |
| 8894805 | Electron beam plasma source with profiled magnet shield for uniform plasma generation | Kallol Bera, Shahid Rauf, Leonid Dorf, Kenneth S. Collins, Gary Leray | 2014-11-25 |