Issued Patents All Time
Showing 25 most recent of 59 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12049961 | Chamber body design architecture for next generation advanced plasma technology | Nicolas Bright, Andrew Nguyen | 2024-07-30 |
| 11333246 | Chamber body design architecture for next generation advanced plasma technology | Andrew Nguyen, Nicolas Bright | 2022-05-17 |
| 10770269 | Apparatus and methods for reducing particles in semiconductor process chambers | Andrew Nguyen, Shahid Rauf, Ajit Balakrishna, Tom Choi, Kenneth S. Collins +3 more | 2020-09-08 |
| 9960052 | Methods for etching a metal layer to form an interconnection structure for semiconductor applications | Sumit Agarwal, Ann Chien, Chiu-pien KUO, Mark Hoinkis | 2018-05-01 |
| 9761416 | Apparatus and methods for reducing particles in semiconductor process chambers | Andrew Nguyen, Shahid Rauf, Ajit Balakrishna, Tom K. Cho, Kenneth S. Collins +3 more | 2017-09-12 |
| 9543163 | Methods for forming features in a material layer utilizing a combination of a main etching and a cyclical etching process | Mang-Mang Ling, Jungmin Ko, Sean S. Kang, Jeremiah T. Pender, Srinivas D. Nemani | 2017-01-10 |
| 9359679 | Methods for cyclically etching a metal layer for an interconnection structure for semiconductor applications | Sumit Agarwal | 2016-06-07 |
| 9287095 | Semiconductor system assemblies and methods of operation | Andrew Nguyen, Kartik Ramaswamy, Srinivas D. Nemani, Yogananda Sarode Vishwanath | 2016-03-15 |
| 8980758 | Methods for etching an etching stop layer utilizing a cyclical etching process | Mang-Mang Ling, Sean S. Kang, Jeremiah T. Pender, Srinivas D. Nemani | 2015-03-17 |
| 8093155 | Method of controlling striations and CD loss in contact oxide etch | Li Li | 2012-01-10 |
| 7952694 | Optical system and methods for monitoring erosion of electrostatic chuck edge bead materials | Eric A. Pape, Siwen Li | 2011-05-31 |
| 7884925 | Electrical and optical system and methods for monitoring erosion of electrostatic chuck edge bead materials | Eric A. Pape, Siwen Li | 2011-02-08 |
| 7625460 | Multifrequency plasma reactor | — | 2009-12-01 |
| 7615164 | Plasma etching methods and contact opening forming methods | Max Hineman | 2009-11-10 |
| 7573116 | Etch aided by electrically shorting upper and lower sidewall portions during the formation of a semiconductor device | Dinesh Chopra | 2009-08-11 |
| 7538028 | Barrier layer, IC via, and IC line forming methods | Gurtej S. Sandu | 2009-05-26 |
| 7470625 | Method of plasma etching a substrate | Li Li | 2008-12-30 |
| 7323292 | Process for using photo-definable layers in the manufacture of semiconductor devices and resulting structures of same | — | 2008-01-29 |
| 7271089 | Barrier layer, IC via, and IC line forming methods | Gurtej S. Sandu | 2007-09-18 |
| 7255803 | Method of forming contact openings | Max Hineman | 2007-08-14 |
| 7122480 | Method of plasma etching a substrate | Li Li | 2006-10-17 |
| 7094699 | Etch aided by electrically shorting upper and lower sidewall portions during the formation of a semiconductor device | Dinesh Chopra | 2006-08-22 |
| 6958297 | Plasma etching methods | David S. Becker, Kevin G. Donohoe | 2005-10-25 |
| 6812154 | Plasma etching methods | David S. Becker, Kevin G. Donohoe | 2004-11-02 |
| 6753264 | Method of controlling striations and CD loss in contact oxide etch | Li Li | 2004-06-22 |