Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11302519 | Method of patterning a low-k dielectric film | Srinivas D. Nemani, Qingjun Zhou, Dmitry Lubomirsky, Sergey G. Belostotskiy | 2022-04-12 |
| 9721807 | Cyclic spacer etching process with improved profile control | Qingjun Zhou, Jungmin Ko, Tom Choi, Sean S. Kang, Srinivas D. Nemani +1 more | 2017-08-01 |
| 9543163 | Methods for forming features in a material layer utilizing a combination of a main etching and a cyclical etching process | Mang-Mang Ling, Jungmin Ko, Sean S. Kang, Srinivas D. Nemani, Bradley J. Howard | 2017-01-10 |
| 9514953 | Methods for barrier layer removal | Chia-Ling Kao, Sean S. Kang, Srinivas D. Nemani, He Ren, Mehul Naik | 2016-12-06 |
| 9478433 | Cyclic spacer etching process with improved profile control | Qingjun Zhou, Jungmin Ko, Tom Choi, Sean S. Kang, Srinivas D. Nemani +1 more | 2016-10-25 |
| 9299577 | Methods for etching a dielectric barrier layer in a dual damascene structure | He Ren, Chia-Ling Kao, Sean S. Kang, Srinivas D. Nemani, Mehul Naik | 2016-03-29 |
| 9165783 | Method of patterning a low-k dielectric film | Srinivas D. Nemani, Qingjun Zhou, Dmitry Lubomirsky, Sergey G. Belostotskiy | 2015-10-20 |
| 9093389 | Method of patterning a silicon nitride dielectric film | Srinivas D. Nemani, Qingjun Zhou, Dmitry Lubomirsky, Sergey G. Belostotskiy | 2015-07-28 |
| 8980754 | Method of removing a photoresist from a low-k dielectric film | Yifeng Zhou, Srinivas D. Nemani, Khoi Doan | 2015-03-17 |
| 8980758 | Methods for etching an etching stop layer utilizing a cyclical etching process | Mang-Mang Ling, Sean S. Kang, Srinivas D. Nemani, Bradley J. Howard | 2015-03-17 |
| 8932959 | Method and system for etching plural layers on a workpiece including a lower layer containing an advanced memory material | Srinivas D. Nemani, Mang-Mang Ling, Kartik Ramaswamy, Andrew Nguyen, Sergey G. Belostotskiy +1 more | 2015-01-13 |
| 8802572 | Method of patterning a low-k dielectric film | Srinivas D. Nemani, Qingjun Zhou, Dmitry Lubomirsky, Sergey G. Belostotskiy | 2014-08-12 |
| 8748322 | Silicon oxide recess etch | Nancy Fung, David T. Or, Qingjun Zhou, Lina Zhu, Srinivas D. Nemani +3 more | 2014-06-10 |
| 8647990 | Method of patterning a low-K dielectric film | Yifeng Zhou, Srinivas D. Nemani, Khoi Doan | 2014-02-11 |
| 8314033 | Method of patterning a low-k dielectric film | Yifeng Zhou, Srinivas D. Nemani, Khoi Doan | 2012-11-20 |
| 8143138 | Method for fabricating interconnect structures for semiconductor devices | Ryan Patz, Igor Peidous, Michael D. Armacost | 2012-03-27 |
| 7848898 | Method for monitoring process drift using plasma characteristics | Steven C. Shannon, Daniel J. Hoffman, Tarreg Mawari | 2010-12-07 |
| 7620511 | Method for determining plasma characteristics | Steven C. Shannon, Daniel J. Hoffman, Tarreg Mawari | 2009-11-17 |
| 7575007 | Chamber recovery after opening barrier over copper | Hairong Tang, Xiaoye Zhao, Keiji Horioka | 2009-08-18 |
| 7440859 | Method for determining plasma characteristics | Steven C. Shannon, Daniel J. Hoffman, Tarreg Mawari | 2008-10-21 |
| 7309448 | Selective etch process of a sacrificial light absorbing material (SLAM) over a dielectric material | Hee Yeop Chae, Gerardo Delgadino, Xiaoye Zhao, Yan Ye | 2007-12-18 |
| 7300597 | Selective etch process of a sacrificial light absorbing material (SLAM) over a dielectric material | Hee Yeop Chae, Gerardo Delgadino, Xiaoye Zhao, Yan Ye | 2007-11-27 |
| 7286948 | Method for determining plasma characteristics | Steven C. Shannon, Daniel J. Hoffman, Tarreg Mawari | 2007-10-23 |
| 6440864 | Substrate cleaning process | Thomas J. Kropewnicki, Henry Fong, Charles Peter Auglis, Raymond Hung, Hongqing Shan | 2002-08-27 |