Issued Patents All Time
Showing 25 most recent of 115 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12125689 | Methods and apparatus for toroidal plasma generation | Kartik Ramaswamy, Yang Yang, Sathya Swaroop Ganta, Fernando Silveira, Yue Guo +1 more | 2024-10-22 |
| 12100576 | Metal oxide preclean chamber with improved selectivity and flow conductance | Xue Yang Chang, Yu Lei, Xianmin Tang, John C. Forster, Yogananda Sarode Vishwanath +2 more | 2024-09-24 |
| 12094715 | Abatement and strip process chamber in a load lock configuration | Martin Jeffrey Salinas, Paul B. Reuter, Jared Ahmad Lee | 2024-09-17 |
| 12049961 | Chamber body design architecture for next generation advanced plasma technology | Bradley J. Howard, Nicolas Bright | 2024-07-30 |
| 12020965 | Magnetic holding structures for plasma processing applications | Sathya Swaroop Ganta, Kallol Bera, Canfeng Lai | 2024-06-25 |
| 11984302 | Magnetic-material shield around plasma chambers near pedestal | Job George Konnoth Joseph, Sathya Swaroop Ganta, Kallol Bera, Jay D. Pinson, II, Akshay Dhanakshirur +6 more | 2024-05-14 |
| 11835146 | Symmetric flow valve for flow conductance control | Yogananda Sarode Vishwanath, Xue Yang Chang, Anilkumar Rayaroth, Chetan Naik, Balachandra Jatak Narayan | 2023-12-05 |
| 11488812 | Method and apparatus for reducing particle defects in plasma etch chambers | Xikun Wang, Changhun Lee, Xiaoming He, Meihua Shen | 2022-11-01 |
| 11447868 | Method for controlling a plasma process | Kartik Ramaswamy, Michael G. Chafin, Yang Yang, Anilkumar Rayaroth, Lu Liu | 2022-09-20 |
| 11333246 | Chamber body design architecture for next generation advanced plasma technology | Bradley J. Howard, Nicolas Bright | 2022-05-17 |
| 11315760 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Douglas A. Buchberger, Jr. +3 more | 2022-04-26 |
| 11211282 | Apparatus to reduce contamination in a plasma etching chamber | Xue Yang Chang | 2021-12-28 |
| 11199267 | Symmetric flow valve for higher flow conductance | Yogananda Sarode Vishwanath, Xue Yang Chang, Anilkumar Rayaroth, Chetan Naik, Balachandra Jatak Narayan | 2021-12-14 |
| 10847351 | Plasma chamber with tandem processing regions | Yogananda Sarode Vishwanath, Xue Yang Chang | 2020-11-24 |
| 10840062 | Radio frequency filter system for a processing chamber | Michael G. Chafin, Lu Liu, Anilkumar Rayaroth | 2020-11-17 |
| 10811233 | Process chamber having tunable showerhead and tunable liner | Xue Yang Chang, Haitao Wang, Kei-Yu Ko, Reza Sadjadi | 2020-10-20 |
| 10770328 | Substrate support with symmetrical feed structure | Xing Lin, Douglas A. Buchberger, Jr., Xiaoping Zhou, Anchel Sheyner | 2020-09-08 |
| 10770269 | Apparatus and methods for reducing particles in semiconductor process chambers | Bradley J. Howard, Shahid Rauf, Ajit Balakrishna, Tom Choi, Kenneth S. Collins +3 more | 2020-09-08 |
| 10672591 | Apparatus for removing particles from a twin chamber processing system | Tom K. Cho, Kartik Ramaswamy, Yogananda Sarode Vishwanath | 2020-06-02 |
| 10658161 | Method and apparatus for reducing particle defects in plasma etch chambers | Xikun Wang, Changhun Lee, Xiaoming He, Meihua Shen | 2020-05-19 |
| 10615006 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Douglas A. Buchberger, Jr. +3 more | 2020-04-07 |
| 10580620 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Douglas A. Buchberger, Jr. +3 more | 2020-03-03 |
| 10573493 | Inductively coupled plasma apparatus | Valentin N. Todorow, Samer Banna, Ankur Agarwal, Zhigang Chen, TSE-CHIANG WANG +2 more | 2020-02-25 |
| 10546728 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Douglas A. Buchberger, Jr. +3 more | 2020-01-28 |
| 10535502 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Douglas A. Buchberger, Jr. +3 more | 2020-01-14 |