AA

Ankur Agarwal

Applied Materials: 17 patents #785 of 7,310Top 15%
AM AMD: 1 patents #5,683 of 9,279Top 65%
SL Spansion Llc.: 1 patents #435 of 769Top 60%
Overall (All Time): #254,375 of 4,157,543Top 7%
18
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
10790180 Electrostatic chuck with variable pixelated magnetic field Chih-Hsun Hsu, Tza-Jing Gung, Benjamin Schwarz, Shahid Rauf, Vijay D. Parkhe +2 more 2020-09-29
10573493 Inductively coupled plasma apparatus Valentin N. Todorow, Samer Banna, Zhigang Chen, TSE-CHIANG WANG, Andrew Nguyen +2 more 2020-02-25
10460968 Electrostatic chuck with variable pixelated magnetic field Chih-Hsun Hsu, Tza-Jing Gung, Benjamin Schwarz, Shahid Rauf, Vijay D. Parkhe +2 more 2019-10-29
10395896 Method and apparatus for ion energy distribution manipulation for plasma processing chambers that allows ion energy boosting through amplitude modulation Wonseok Lee, Kartik Ramaswamy, Haitao Wang 2019-08-27
10131994 Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more 2018-11-20
9978606 Methods for atomic level resolution and plasma processing control 2018-05-22
9896769 Inductively coupled plasma source with multiple dielectric windows and window-supporting structure Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more 2018-02-20
9745663 Symmetrical inductively coupled plasma source with symmetrical flow chamber Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more 2017-08-29
9520294 Atomic layer etch process using an electron beam Rajinder Dhindsa, Shahid Rauf 2016-12-13
9449796 Plasma processing system including a symmetrical remote plasma source for minimal ion energy Ajit Balakrishna, Rajinder Dhindsa 2016-09-20
9362131 Fast atomic layer etch process using an electron beam Shahid Rauf, Kartik Ramaswamy 2016-06-07
8980760 Methods and apparatus for controlling plasma in a process chamber Ajit Balakrishna, Shahid Rauf 2015-03-17
8974684 Synchronous embedded radio frequency pulsing for plasma etching Samer Banna 2015-03-10
8962488 Synchronized radio frequency pulsing for plasma etching Bryan Liao, Katsumasa Kawasaki, Yashaswini B. Pattar, Sergio Fukuda Shoji, Duy D. Nguyen +3 more 2015-02-24
8562742 Apparatus for radial delivery of gas to a chamber and methods of use thereof Jared Ahmad Lee, Martin Jeff Salinas, Ezra Robert Gold, James P. Cruse, Aniruddha Pal +1 more 2013-10-22
8404598 Synchronized radio frequency pulsing for plasma etching Bryan Liao, Katsumasa Kawasaki, Yashaswini B. Pattar, Sergio Fukuda Shoji, Duy D. Nguyen +3 more 2013-03-26
8382999 Pulsed plasma high aspect ratio dielectric process Kenneth S. Collins, Shahid Rauf, Kartik Ramaswamy, Thorsten Lill 2013-02-26
7704878 Contact spacer formation using atomic layer deposition Minh Van Ngo, Angela T. Hui, Amol Joshi, Wenmei Li, Ning Cheng +1 more 2010-04-27