Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10790180 | Electrostatic chuck with variable pixelated magnetic field | Chih-Hsun Hsu, Tza-Jing Gung, Benjamin Schwarz, Shahid Rauf, Vijay D. Parkhe +2 more | 2020-09-29 |
| 10573493 | Inductively coupled plasma apparatus | Valentin N. Todorow, Samer Banna, Zhigang Chen, TSE-CHIANG WANG, Andrew Nguyen +2 more | 2020-02-25 |
| 10460968 | Electrostatic chuck with variable pixelated magnetic field | Chih-Hsun Hsu, Tza-Jing Gung, Benjamin Schwarz, Shahid Rauf, Vijay D. Parkhe +2 more | 2019-10-29 |
| 10395896 | Method and apparatus for ion energy distribution manipulation for plasma processing chambers that allows ion energy boosting through amplitude modulation | Wonseok Lee, Kartik Ramaswamy, Haitao Wang | 2019-08-27 |
| 10131994 | Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow | Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more | 2018-11-20 |
| 9978606 | Methods for atomic level resolution and plasma processing control | — | 2018-05-22 |
| 9896769 | Inductively coupled plasma source with multiple dielectric windows and window-supporting structure | Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more | 2018-02-20 |
| 9745663 | Symmetrical inductively coupled plasma source with symmetrical flow chamber | Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more | 2017-08-29 |
| 9520294 | Atomic layer etch process using an electron beam | Rajinder Dhindsa, Shahid Rauf | 2016-12-13 |
| 9449796 | Plasma processing system including a symmetrical remote plasma source for minimal ion energy | Ajit Balakrishna, Rajinder Dhindsa | 2016-09-20 |
| 9362131 | Fast atomic layer etch process using an electron beam | Shahid Rauf, Kartik Ramaswamy | 2016-06-07 |
| 8980760 | Methods and apparatus for controlling plasma in a process chamber | Ajit Balakrishna, Shahid Rauf | 2015-03-17 |
| 8974684 | Synchronous embedded radio frequency pulsing for plasma etching | Samer Banna | 2015-03-10 |
| 8962488 | Synchronized radio frequency pulsing for plasma etching | Bryan Liao, Katsumasa Kawasaki, Yashaswini B. Pattar, Sergio Fukuda Shoji, Duy D. Nguyen +3 more | 2015-02-24 |
| 8562742 | Apparatus for radial delivery of gas to a chamber and methods of use thereof | Jared Ahmad Lee, Martin Jeff Salinas, Ezra Robert Gold, James P. Cruse, Aniruddha Pal +1 more | 2013-10-22 |
| 8404598 | Synchronized radio frequency pulsing for plasma etching | Bryan Liao, Katsumasa Kawasaki, Yashaswini B. Pattar, Sergio Fukuda Shoji, Duy D. Nguyen +3 more | 2013-03-26 |
| 8382999 | Pulsed plasma high aspect ratio dielectric process | Kenneth S. Collins, Shahid Rauf, Kartik Ramaswamy, Thorsten Lill | 2013-02-26 |
| 7704878 | Contact spacer formation using atomic layer deposition | Minh Van Ngo, Angela T. Hui, Amol Joshi, Wenmei Li, Ning Cheng +1 more | 2010-04-27 |