| 12487986 |
Generating information integrity instructions using a generative model |
Sebastián Soto |
2025-12-02 |
|
| 12450081 |
System and method for managing size of clusters in a computing environment |
Manoj Krishnan, Rahul Chandrasekaran, Prafulla Mahindrakar, Ravi Cherukupalli |
2025-10-21 |
|
| 10790180 |
Electrostatic chuck with variable pixelated magnetic field |
Chih-Hsun Hsu, Tza-Jing Gung, Benjamin Schwarz, Shahid Rauf, Vijay D. Parkhe +2 more |
2020-09-29 |
$24,138,000 |
| 10573493 |
Inductively coupled plasma apparatus |
Valentin N. Todorow, Samer Banna, Zhigang Chen, TSE-CHIANG WANG, Andrew Nguyen +2 more |
2020-02-25 |
$22,337,000 |
| 10460968 |
Electrostatic chuck with variable pixelated magnetic field |
Chih-Hsun Hsu, Tza-Jing Gung, Benjamin Schwarz, Shahid Rauf, Vijay D. Parkhe +2 more |
2019-10-29 |
$23,960,000 |
| 10395896 |
Method and apparatus for ion energy distribution manipulation for plasma processing chambers that allows ion energy boosting through amplitude modulation |
Wonseok Lee, Kartik Ramaswamy, Haitao Wang |
2019-08-27 |
$34,720,000 |
| 10131994 |
Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow |
Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more |
2018-11-20 |
$33,309,000 |
| 9978606 |
Methods for atomic level resolution and plasma processing control |
— |
2018-05-22 |
$29,000,000 |
| 9896769 |
Inductively coupled plasma source with multiple dielectric windows and window-supporting structure |
Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more |
2018-02-20 |
$63,276,000 |
| 9745663 |
Symmetrical inductively coupled plasma source with symmetrical flow chamber |
Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more |
2017-08-29 |
$19,098,000 |
| 9520294 |
Atomic layer etch process using an electron beam |
Rajinder Dhindsa, Shahid Rauf |
2016-12-13 |
$24,422,000 |
| 9449796 |
Plasma processing system including a symmetrical remote plasma source for minimal ion energy |
Ajit Balakrishna, Rajinder Dhindsa |
2016-09-20 |
$12,933,000 |
| 9362131 |
Fast atomic layer etch process using an electron beam |
Shahid Rauf, Kartik Ramaswamy |
2016-06-07 |
$15,363,000 |
| 8980760 |
Methods and apparatus for controlling plasma in a process chamber |
Ajit Balakrishna, Shahid Rauf |
2015-03-17 |
$8,353,000 |
| 8974684 |
Synchronous embedded radio frequency pulsing for plasma etching |
Samer Banna |
2015-03-10 |
$17,071,000 |
| 8962488 |
Synchronized radio frequency pulsing for plasma etching |
Bryan Liao, Katsumasa Kawasaki, Yashaswini B. Pattar, Sergio Fukuda Shoji, Duy D. Nguyen +3 more |
2015-02-24 |
$19,887,000 |
| 8562742 |
Apparatus for radial delivery of gas to a chamber and methods of use thereof |
Jared Ahmad Lee, Martin Jeff Salinas, Ezra Robert Gold, James P. Cruse, Aniruddha Pal +1 more |
2013-10-22 |
$10,239,000 |
| 8404598 |
Synchronized radio frequency pulsing for plasma etching |
Bryan Liao, Katsumasa Kawasaki, Yashaswini B. Pattar, Sergio Fukuda Shoji, Duy D. Nguyen +3 more |
2013-03-26 |
$10,775,000 |
| 8382999 |
Pulsed plasma high aspect ratio dielectric process |
Kenneth S. Collins, Shahid Rauf, Kartik Ramaswamy, Thorsten Lill |
2013-02-26 |
$7,365,000 |
| 7704878 |
Contact spacer formation using atomic layer deposition |
Minh Van Ngo, Angela T. Hui, Amol Joshi, Wenmei Li, Ning Cheng +1 more |
2010-04-27 |
$10,775,000 |
