Issued Patents All Time
Showing 25 most recent of 106 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12302760 | Ion beam etching with sidewall cleaning | Ivan L. Berry, III | 2025-05-13 |
| 12280091 | Etch selectivity control in atomic layer etching | Andreas Fischer | 2025-04-22 |
| 12253190 | Non-elastomeric, non-polymeric, non-metallic membrane valves for semiconductor processing equipment | Mariusch Gregor, Theodoros Panagopoulos | 2025-03-18 |
| 12127486 | Resistive random access memory with preformed filaments | Hyungsuk Alexander Yoon, Yang Pan | 2024-10-22 |
| 12106946 | Turbomolecular pump and cathode assembly for etching reactor | Mariusch Gregor | 2024-10-01 |
| 12080592 | Film stack simplification for high aspect ratio patterning and vertical scaling | Hui-Jung Wu, Bart J. van Schravendijk, Mark Kawaguchi, Gereng Gunawan, Jay E. Uglow +11 more | 2024-09-03 |
| 12029133 | Ion beam etching with sidewall cleaning | Ivan L. Berry, III | 2024-07-02 |
| 11832533 | Conformal damage-free encapsulation of chalcogenide materials | James S. Sims, Andrew John McKerrow, Meihua Shen, Shane Tang, Kathryn M. Kelchner +4 more | 2023-11-28 |
| 11796085 | Non-elastomeric, non-polymeric, non-metallic membrane valves for semiconductor processing equipment | Mariusch Gregor, Theodoros Panagopoulos | 2023-10-24 |
| 11792987 | Self-aligned vertical integration of three-terminal memory devices | Meihua Shen, John Hoang, Hui-Jung Wu, Gereng Gunawan, Yang Pan | 2023-10-17 |
| 11637022 | Electron excitation atomic layer etch | Ivan L. Berry, III, Andreas Fischer | 2023-04-25 |
| 11520953 | Predicting etch characteristics in thermal etching and atomic layer etching | Andreas Fischer, Ivan L. Berry, III, Nerissa Draeger, Richard A. Gottscho | 2022-12-06 |
| 11380556 | Thermal atomic layer etch with rapid temperature cycling | Theodoros Panagopoulos, Andreas Fischer | 2022-07-05 |
| 11289306 | Ion beam etching utilizing cryogenic wafer temperatures | Ivan L. Berry, III, Anthony J. Ricci | 2022-03-29 |
| 11239420 | Conformal damage-free encapsulation of chalcogenide materials | James S. Sims, Andrew John McKerrow, Meihua Shen, Shane Tang, Kathryn M. Kelchner +4 more | 2022-02-01 |
| 11171021 | Internal plasma grid for semiconductor fabrication | Harmeet Singh, Alex Paterson, Richard A. Marsh, Saravanapriyan Sriraman | 2021-11-09 |
| 11062920 | Ion injector and lens system for ion beam milling | Ivan L. Berry, III | 2021-07-13 |
| 11056322 | Method and apparatus for determining process rate | Yassine Kabouzi, Luc Albarede, Andrew D. Bailey, III, Jorge Luque, Seonkyung Lee | 2021-07-06 |
| 10998167 | Ion beam etch without need for wafer tilt or rotation | Ivan L. Berry, III | 2021-05-04 |
| 10825652 | Ion beam etch without need for wafer tilt or rotation | Ivan L. Berry, III | 2020-11-03 |
| 10804079 | Active showerhead | Mariusch Gregor, David Trussell | 2020-10-13 |
| 10784118 | Atomic layer etching using a combination of plasma and vapor treatments | Andreas Fischer, Richard Janek, John D. Boniface | 2020-09-22 |
| 10784086 | Cobalt etch back | Jialing Yang, Baosuo Zhou, Meihua Shen, John Hoang | 2020-09-22 |
| 10749103 | Dry plasma etch method to pattern MRAM stack | Samantha Tan, Taeseung Kim, Wenbing Yang, Jeffrey Marks | 2020-08-18 |
| 10727073 | Atomic layer etching 3D structures: Si and SiGe and Ge smoothness on horizontal and vertical surfaces | Samantha Tan, Wenbing Yang, Keren Jacobs Kanarik, Yang Pan | 2020-07-28 |