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Gas exhaust by-product measurement system |
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Control of impedance of RF delivery path |
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Method and apparatus for real-time monitoring of plasma chamber wall condition |
Yassine Kabouzi, Jorge Luque |
2018-11-20 |
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Method and apparatus for determining process rate |
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Plasma etching systems and methods using empirical mode decomposition |
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2017-01-17 |
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Control of impedance of RF delivery path |
Alexei Marakhtanov, Rajinder Dhindsa, Ken Lucchesi |
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| 9337000 |
Control of impedance of RF return path |
Alexei Marakhtanov, Rajinder Dhindsa, Ken Lucchesi |
2016-05-10 |
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Chamber matching for power control mode |
— |
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Chamber matching using voltage control mode |
— |
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Arrangement for identifying uncontrolled events at the process module level and methods thereof |
Vijayakumar C. Venugopal |
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| 8473089 |
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Eric A. Pape, Vijayakumar C. Venugopal, Brian Choi |
2013-06-25 |
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RF-biased capacitively-coupled electrostatic (RFB-CCE) probe arrangement for characterizing a film in a plasma processing chamber |
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2012-04-24 |
