Issued Patents All Time
Showing 25 most recent of 196 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12397330 | Condition selectable backside gas | Stephen Prouty, Martin Perez-Guzman, Sumanth Banda, Alvaro Garcia de Gorordo | 2025-08-26 |
| 12354847 | Methods and apparatus for conductance liners in semiconductor process chambers | Timothy Joseph Franklin, Daniel Sang Byun, Carlaton WONG | 2025-07-08 |
| 12255055 | Integrated cleaning process for substrate etching | Yi Zhou, Seul Ki Ahn, Seung-Young Son, Li-Te Chang, Sunil Srinivasan | 2025-03-18 |
| 12255051 | Multi-shape voltage pulse trains for uniformity and etch profile tuning | Linying Cui, James Rogers, Daniel Sang Byun, Keith HERNANDEZ | 2025-03-18 |
| 12237148 | Plasma processing assembly using pulsed-voltage and radio-frequency power | Leonid Dorf, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy, Yue Guo +4 more | 2025-02-25 |
| 12211734 | Lift pin mechanism | Alexander SULYMAN, Carlaton WONG, Timothy Joseph Franklin, Steven E. Babayan, Anwar Husain +2 more | 2025-01-28 |
| 12142469 | Plasma processing chambers configured for tunable substrate and edge sheath control | — | 2024-11-12 |
| 12094752 | Wafer edge ring lifting solution | Michael R. Rice, Yogananda Sarode Vishwanath, Sunil Srinivasan, Steven E. Babayan, Olivier Luere +2 more | 2024-09-17 |
| 12057292 | Feedback loop for controlling a pulsed voltage waveform | Leonid Dorf, Evgeny Kamenetskiy, James Rogers, Olivier Luere, Viacheslav Plotnikov | 2024-08-06 |
| 12009236 | Sensors and system for in-situ edge ring erosion monitor | Yaoling Pan, Patrick Tae, Michael D. Willwerth, Leonard Tedeschi, Daniel Sang Byun +5 more | 2024-06-11 |
| 11984306 | Plasma chamber and chamber component cleaning methods | Linying Cui, James Rogers | 2024-05-14 |
| 11848176 | Plasma processing using pulsed-voltage and radio-frequency power | Leonid Dorf, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy, Yue Guo +3 more | 2023-12-19 |
| 11817312 | Delayed pulsing for plasma processing of wafers | Akhil Mehrotra, Vinay Shankar Vidyarthi, Daksh Agarwal, SAMANEH SADIGHI, Jason A. Kenney | 2023-11-14 |
| 11810768 | Temperature and bias control of edge ring | James Rogers, Linying Cui | 2023-11-07 |
| 11791140 | Confinement ring for use in a plasma processing system | Akira Koshiishi, Alexei Marakhatanov | 2023-10-17 |
| 11776789 | Plasma processing assembly using pulsed-voltage and radio-frequency power | Leonid Dorf, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy, Yue Guo +4 more | 2023-10-03 |
| 11728124 | Creating ion energy distribution functions (IEDF) | Leonid Dorf, Travis Koh, Olivier Luere, Olivier Joubert, Philip Allan Kraus +1 more | 2023-08-15 |
| 11699572 | Feedback loop for controlling a pulsed voltage waveform | Leonid Dorf, Evgeny Kamenetskiy, James Rogers, Olivier Luere, Viacheslav Plotnikov | 2023-07-11 |
| 11670486 | Pulsed plasma chamber in dual chamber configuration | Alexei Marakhtanov, Eric A. Hudson, Andrew D. Bailey, III | 2023-06-06 |
| 11668553 | Apparatus and method for controlling edge ring variation | Sathyendra Ghantasala, Leonid Dorf, Evgeny Kamenetskiy, Peter Muraoka, Denis M. Koosau +1 more | 2023-06-06 |
| 11666952 | Condition selectable backside gas | Stephen Prouty, Martin Perez-Guzman, Sumanth Banda, Alvaro Garcia de Gorordo | 2023-06-06 |
| 11594400 | Multi zone gas injection upper electrode system | Ryan Bise, Alexei Marakhtanov, Lumin Li, Sang Ki Nam, Jim Rogers +6 more | 2023-02-28 |
| 11551916 | Sheath and temperature control of a process kit in a substrate processing chamber | Jaeyong Cho, James Rogers, Anwar Husain | 2023-01-10 |
| 11521838 | Integrated cleaning process for substrate etching | Yi Zhou, Seul Ki Ahn, Seung-Young Son, Li-Te Chang, Sunil Srinivasan | 2022-12-06 |
| 11521849 | In-situ deposition process | Sang Wook Park, Sunil Srinivasan, Jonathan Kim, Lin YU, Zhonghua Yao +1 more | 2022-12-06 |