Issued Patents All Time
Showing 1–25 of 66 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11798788 | Hollow cathode, an apparatus including a hollow cathode for manufacturing a semiconductor device, and a method of manufacturing a semiconductor device using a hollow cathode | Sang Ki Nam, Sunggil Kang, Sungyong Lim, Beomjin Yoo, Vasily Pashkovskiy +1 more | 2023-10-24 |
| 11791140 | Confinement ring for use in a plasma processing system | Rajinder Dhindsa, Alexei Marakhatanov | 2023-10-17 |
| 11348760 | Plasma processing apparatus and method of manufacturing semiconductor device using the same | Masato Horiguchi, YongWoo Lee, Kyohyeok Kim, Dowon Kim, Yunhwan Kim +3 more | 2022-05-31 |
| 11342166 | Confinement ring for use in a plasma processing system | Rajinder Dhindsa, Alexei Marakhatanov | 2022-05-24 |
| 11195696 | Electron beam generator, plasma processing apparatus having the same and plasma processing method using the same | Dongkyu Shin, Sangki Nam, Soonam Park, Kyuhee Han | 2021-12-07 |
| 10950414 | Plasma processing apparatus and method of manufacturing semiconductor device using the same | Sang Ki Nam, Kwangyoub Heo, Sunggil Kang, Beomjin Yoo, Sungyong Lim +1 more | 2021-03-16 |
| 10861678 | Plasma etching apparatus and method | Noriyuki Kobayashi, Shigeru Yoneda, Kenichi Hanawa, Shigeru Tahara, Masaru Sugimoto | 2020-12-08 |
| 10854431 | Plasma processing apparatus and method | Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani +11 more | 2020-12-01 |
| 10720314 | Confinement ring for use in a plasma processing system | Rajinder Dhindsa, Alexei Marakhatanov | 2020-07-21 |
| 10546727 | Plasma processing apparatus and method | Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani +11 more | 2020-01-28 |
| 10529539 | Plasma processing apparatus and method | Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani +10 more | 2020-01-07 |
| 10529596 | Capacitive coupling plasma processing apparatus and method for using the same | Naoki Matsumoto, Chishio Koshimizu | 2020-01-07 |
| 10347499 | Method for etching layer to be etched | Koji Maruyama, Toshio Haga, Masato Horiguchi, Makoto Kato | 2019-07-09 |
| 10229815 | Plasma etching apparatus and method | Noriyuki Kobayashi, Shigeru Yoneda, Kenichi Hanawa, Shigeru Tahara, Masaru Sugimoto | 2019-03-12 |
| 9685305 | Plasma processing apparatus and plasma processing method | Koji Maruyama, Masato Horiguchi, Tetsuri Matsuki | 2017-06-20 |
| 9607866 | Capacitive coupling plasma processing apparatus and method for using the same | Naoki Matsumoto, Chishio Koshimizu | 2017-03-28 |
| 9490105 | Plasma processing apparatus and method | Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani +11 more | 2016-11-08 |
| 9177756 | E-beam enhanced decoupled source for semiconductor processing | John Holland, Peter L. G. Ventzek, Harmeet Singh, Jun Shinagawa | 2015-11-03 |
| 9111728 | E-beam enhanced decoupled source for semiconductor processing | John Holland, Peter L. G. Ventzek, Harmeet Singh, Jun Shinagawa | 2015-08-18 |
| 8980046 | Semiconductor processing system with source for decoupled ion and radical control | Peter L. G. Ventzek, Jun Shinagawa, John Holland | 2015-03-17 |
| 8852385 | Plasma etching apparatus and method | Noriyuki Kobayashi, Shigeru Yoneda, Kenichi Hanawa, Shigeru Tahara, Masaru Sugimoto | 2014-10-07 |
| 8790490 | Plasma processing apparatus and method | Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani +6 more | 2014-07-29 |
| 8741098 | Table for use in plasma processing system and plasma processing system | Shinji Himori, Shoichiro Matsuyama | 2014-06-03 |
| 8627783 | Combined wafer area pressure control and plasma confinement assembly | Andreas Fischer | 2014-01-14 |
| 8603293 | Plasma processing apparatus and method | Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani +11 more | 2013-12-10 |