Issued Patents All Time
Showing 25 most recent of 77 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12340979 | Semiconductor processing chamber for improved precursor flow | Tien Fak Tan, Dmitry Lubomirsky, Soonwook Jung, Raymond W. Lu, Phong Pham +1 more | 2025-06-24 |
| 12288675 | Cylindrical cavity with impedance shifting by irises in a power-supplying waveguide | Satoru Kobayashi, Hideo Sugai, Toan Q. Tran, Dmitry Lubomirsky | 2025-04-29 |
| 12146219 | Flow control features of CVD chambers | Kien N. Chuc, Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller +5 more | 2024-11-19 |
| 12009228 | Low temperature chuck for plasma processing systems | Toan Q. Tran, Zilu Weng, Dmitry Lubomirsky, Satoru Kobayashi, Tae Seung Cho +2 more | 2024-06-11 |
| 11972930 | Cylindrical cavity with impedance shifting by irises in a power-supplying waveguide | Satoru Kobayashi, Hideo Sugai, Toan Q. Tran, Dmitry Lubomirsky | 2024-04-30 |
| 11915950 | Multi-zone semiconductor substrate supports | Mehmet Tugrul Samir, Dongqing Yang, Dmitry Lubomirsky, Peter M. Hillman, Martin Yue Choy +1 more | 2024-02-27 |
| 11834744 | Ceramic showerheads with conductive electrodes | Laksheswar Kalita, Dmitry Lubomirsky, Tien Fak Tan, LokKee Loh, Saravjeet Singh +1 more | 2023-12-05 |
| 11735441 | Systems and methods for improved semiconductor etching and component protection | Tien Fak Tan, Lok Kee Loh, Dmitry Lubomirsky, Soonwook Jung, Martin Yue Choy | 2023-08-22 |
| 11728139 | Process chamber for cyclic and selective material removal and etching | Toan Q. Tran, Junghoon Kim, Dmitry Lubomirsky | 2023-08-15 |
| 11591693 | Ceramic showerheads with conductive electrodes | Laksheswar Kalita, Dmitry Lubomirsky, Tien Fak Tan, LokKee Loh, Saravjeet Singh +1 more | 2023-02-28 |
| 11594428 | Low temperature chuck for plasma processing systems | Toan Q. Tran, Zilu Weng, Dmitry Lubomirsky, Satoru Kobayashi, Tae Seung Cho +2 more | 2023-02-28 |
| 11562890 | Corrosion resistant ground shield of processing chamber | Dmitry Lubomirsky, Xiao-Ming He, Jennifer Y. Sun, Xiaowei Wu, Laksheswar Kalita | 2023-01-24 |
| 11538697 | Substrate processing apparatus | Sang Ki Nam, Jang-Yeob Lee, Sungyeol Kim, Sunghyup Kim, Siqing Lu | 2022-12-27 |
| 11476093 | Plasma etching systems and methods with secondary plasma injection | Toan Q. Tran, Zilu Weng, Dmitry Lubomirsky | 2022-10-18 |
| 11361939 | Semiconductor processing chamber for multiple precursor flow | Mehmet Tugrul Samir, Dongqing Yang, Dmitry Lubomirsky, Peter M. Hillman, Martin Yue Choy +1 more | 2022-06-14 |
| 11355317 | Methods and apparatus for dynamical control of radial uniformity in microwave chambers | Satoru Kobayashi, Lance A. Scudder, David Alexander BRITZ, Dmitry Lubomirsky, Hideo Sugai | 2022-06-07 |
| 11276590 | Multi-zone semiconductor substrate supports | Mehmet Tugrul Samir, Dongqing Yang, Dmitry Lubomirsky, Peter M. Hillman, Martin Yue Choy +1 more | 2022-03-15 |
| 11276559 | Semiconductor processing chamber for multiple precursor flow | Mehmet Tugrul Samir, Dongqing Yang, Dmitry Lubomirsky, Peter M. Hillman, Martin Yue Choy +1 more | 2022-03-15 |
| 11264213 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Jang-Gyoo Yang +4 more | 2022-03-01 |
| 11195696 | Electron beam generator, plasma processing apparatus having the same and plasma processing method using the same | Dongkyu Shin, Sangki Nam, Akira Koshiishi, Kyuhee Han | 2021-12-07 |
| 11195699 | Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide | Satoru Kobayashi, Hideo Sugai, Toan Q. Tran, Dmitry Lubomirsky | 2021-12-07 |
| 11062887 | High temperature RF heater pedestals | David Benjaminson, Xikun Wang, Dmitry Lubomirsky | 2021-07-13 |
| 11049755 | Semiconductor substrate supports with embedded RF shield | David Benjaminson, Michael H. Grace, Dmitry Lubomirsky, Jaeyong Cho, Nikolai Kalnin +1 more | 2021-06-29 |
| 11004661 | Process chamber for cyclic and selective material removal and etching | Toan Q. Tran, Junghoon Kim, Dmitry Lubomirsky | 2021-05-11 |
| 10920320 | Plasma health determination in semiconductor substrate processing reactors | Junghoon Kim, Tae Seung Cho, Dmitry Lubomirsky, Nikolai Kalnin | 2021-02-16 |