Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12146219 | Flow control features of CVD chambers | Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller, Soonam Park +5 more | 2024-11-19 |
| 11512391 | Process kit for a high throughput processing chamber | Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Sungjin Kim, Yanjie Wang | 2022-11-29 |
| D946534 | Radio frequency conduit | Adam J. Fischbach, Canfeng Lai, Carlaton WONG | 2022-03-22 |
| 11270905 | Modulating film properties by optimizing plasma coupling materials | Eswaranand Venkatasubramanian, Edward Haywood, Samuel E. Gottheim, Pramit Manna, Adam J. Fischbach +2 more | 2022-03-08 |
| 11264213 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more | 2022-03-01 |
| 10724138 | Process kit for a high throughput processing chamber | Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Sungjin Kim, Yanjie Wang | 2020-07-28 |
| 10711347 | Micro-volume deposition chamber | Dale R. DuBois, Karthik Janakiraman | 2020-07-14 |
| 10550472 | Flow control features of CVD chambers | Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller, Soonam Park +5 more | 2020-02-04 |
| 10354843 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more | 2019-07-16 |
| 10283321 | Semiconductor processing system and methods using capacitively coupled plasma | Jang-Gyoo Yang, Matthew L. Miller, Xinglong Chen, Qiwei Liang, Shankar Venkataraman +1 more | 2019-05-07 |
| 10240234 | Gas distribution apparatus for processing chambers | Dale R. Du Bois, Karthik Janakiraman | 2019-03-26 |
| 10113231 | Process kit including flow isolator ring | Dale R. DuBois, Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Yanjie Wang +1 more | 2018-10-30 |
| 10017855 | Process kit for a high throughput processing chamber | Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Sungjin Kim, Yanjie Wang | 2018-07-10 |
| 9978564 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more | 2018-05-22 |
| 9144147 | Semiconductor processing system and methods using capacitively coupled plasma | Jang-Gyoo Yang, Matthew L. Miller, Xinglong Chen, Qiwei Liang, Shankar Venkataraman +1 more | 2015-09-22 |
| 9132436 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more | 2015-09-15 |
| 8894767 | Flow control features of CVD chambers | Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller, Soonam Park +5 more | 2014-11-25 |
| 8771538 | Plasma source design | Dmitry Lubomirsky, Jang-Gyoo Yang, Matthew L. Miller, Jay D. Pinson, II | 2014-07-08 |
| 8742665 | Plasma source design | Dmitry Lubomirsky, Jang-Gyoo Yang, Matthew L. Miller, Jay D. Pinson, II | 2014-06-03 |
| 6401652 | Plasma reactor inductive coil antenna with flat surface facing the plasma | Jonathan D. Mohn, Arthur H. Sato | 2002-06-11 |
| 5537508 | Method and dry vapor generator channel assembly for conveying a liquid from a liquid source to a liquid vaporizer with minimal liquid stagnation | Peter Ebbing | 1996-07-16 |
| 5212537 | Calibration technique for monochromators and spectrophotometers | Monoocher Birang, Ronnie Northrup, Bruno Strul | 1993-05-18 |
| 5129994 | Method and apparatus to inhibit obstruction of optical transmission through semiconductor etch process chamber viewport | Peter Ebbing, Jack Ford, Fred H. Hariz, Michael Sugarman | 1992-07-14 |