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Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Sungjin Kim, Yanjie Wang |
2022-11-29 |
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Radio frequency conduit |
Adam J. Fischbach, Canfeng Lai, Carlaton WONG |
2022-03-22 |
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Modulating film properties by optimizing plasma coupling materials |
Eswaranand Venkatasubramanian, Edward Haywood, Samuel E. Gottheim, Pramit Manna, Adam J. Fischbach +2 more |
2022-03-08 |
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Chemical control features in wafer process equipment |
Qiwei Liang, Xinglong Chen, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more |
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Process kit for a high throughput processing chamber |
Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Sungjin Kim, Yanjie Wang |
2020-07-28 |
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Micro-volume deposition chamber |
Dale R. DuBois, Karthik Janakiraman |
2020-07-14 |
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Flow control features of CVD chambers |
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2020-02-04 |
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Chemical control features in wafer process equipment |
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Semiconductor processing system and methods using capacitively coupled plasma |
Jang-Gyoo Yang, Matthew L. Miller, Xinglong Chen, Qiwei Liang, Shankar Venkataraman +1 more |
2019-05-07 |
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Gas distribution apparatus for processing chambers |
Dale R. Du Bois, Karthik Janakiraman |
2019-03-26 |
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Process kit including flow isolator ring |
Dale R. DuBois, Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Yanjie Wang +1 more |
2018-10-30 |
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Process kit for a high throughput processing chamber |
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2018-07-10 |
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Chemical control features in wafer process equipment |
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2018-05-22 |
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Semiconductor processing system and methods using capacitively coupled plasma |
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Chemical control features in wafer process equipment |
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2015-09-15 |
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Flow control features of CVD chambers |
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2014-11-25 |
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Plasma source design |
Dmitry Lubomirsky, Jang-Gyoo Yang, Matthew L. Miller, Jay D. Pinson, II |
2014-07-08 |
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Plasma source design |
Dmitry Lubomirsky, Jang-Gyoo Yang, Matthew L. Miller, Jay D. Pinson, II |
2014-06-03 |
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Plasma reactor inductive coil antenna with flat surface facing the plasma |
Jonathan D. Mohn, Arthur H. Sato |
2002-06-11 |
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Method and dry vapor generator channel assembly for conveying a liquid from a liquid source to a liquid vaporizer with minimal liquid stagnation |
Peter Ebbing |
1996-07-16 |
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Calibration technique for monochromators and spectrophotometers |
Monoocher Birang, Ronnie Northrup, Bruno Strul |
1993-05-18 |
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Method and apparatus to inhibit obstruction of optical transmission through semiconductor etch process chamber viewport |
Peter Ebbing, Jack Ford, Fred H. Hariz, Michael Sugarman |
1992-07-14 |