| 12146219 |
Flow control features of CVD chambers |
Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller, Soonam Park +5 more |
2024-11-19 |
$80,955,000 |
| 11512391 |
Process kit for a high throughput processing chamber |
Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Sungjin Kim, Yanjie Wang |
2022-11-29 |
$23,914,000 |
| D946534 |
Radio frequency conduit |
Adam J. Fischbach, Canfeng Lai, Carlaton WONG |
2022-03-22 |
|
| 11270905 |
Modulating film properties by optimizing plasma coupling materials |
Eswaranand Venkatasubramanian, Edward Haywood, Samuel E. Gottheim, Pramit Manna, Adam J. Fischbach +2 more |
2022-03-08 |
$69,139,000 |
| 11264213 |
Chemical control features in wafer process equipment |
Qiwei Liang, Xinglong Chen, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more |
2022-03-01 |
$41,046,000 |
| 10724138 |
Process kit for a high throughput processing chamber |
Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Sungjin Kim, Yanjie Wang |
2020-07-28 |
$35,855,000 |
| 10711347 |
Micro-volume deposition chamber |
Dale R. DuBois, Karthik Janakiraman |
2020-07-14 |
$28,056,000 |
| 10550472 |
Flow control features of CVD chambers |
Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller, Soonam Park +5 more |
2020-02-04 |
$27,329,000 |
| 10354843 |
Chemical control features in wafer process equipment |
Qiwei Liang, Xinglong Chen, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more |
2019-07-16 |
$26,330,000 |
| 10283321 |
Semiconductor processing system and methods using capacitively coupled plasma |
Jang-Gyoo Yang, Matthew L. Miller, Xinglong Chen, Qiwei Liang, Shankar Venkataraman +1 more |
2019-05-07 |
$13,988,000 |
| 10240234 |
Gas distribution apparatus for processing chambers |
Dale R. Du Bois, Karthik Janakiraman |
2019-03-26 |
$22,929,000 |
| 10113231 |
Process kit including flow isolator ring |
Dale R. DuBois, Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Yanjie Wang +1 more |
2018-10-30 |
$15,195,000 |
| 10017855 |
Process kit for a high throughput processing chamber |
Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Sungjin Kim, Yanjie Wang |
2018-07-10 |
$35,896,000 |
| 9978564 |
Chemical control features in wafer process equipment |
Qiwei Liang, Xinglong Chen, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more |
2018-05-22 |
$29,000,000 |
| 9144147 |
Semiconductor processing system and methods using capacitively coupled plasma |
Jang-Gyoo Yang, Matthew L. Miller, Xinglong Chen, Qiwei Liang, Shankar Venkataraman +1 more |
2015-09-22 |
$10,938,000 |
| 9132436 |
Chemical control features in wafer process equipment |
Qiwei Liang, Xinglong Chen, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more |
2015-09-15 |
$32,303,000 |
| 8894767 |
Flow control features of CVD chambers |
Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller, Soonam Park +5 more |
2014-11-25 |
$12,494,000 |
| 8771538 |
Plasma source design |
Dmitry Lubomirsky, Jang-Gyoo Yang, Matthew L. Miller, Jay D. Pinson, II |
2014-07-08 |
$11,201,000 |
| 8742665 |
Plasma source design |
Dmitry Lubomirsky, Jang-Gyoo Yang, Matthew L. Miller, Jay D. Pinson, II |
2014-06-03 |
$21,001,000 |
| 6401652 |
Plasma reactor inductive coil antenna with flat surface facing the plasma |
Jonathan D. Mohn, Arthur H. Sato |
2002-06-11 |
$58,218,000 |
| 5537508 |
Method and dry vapor generator channel assembly for conveying a liquid from a liquid source to a liquid vaporizer with minimal liquid stagnation |
Peter Ebbing |
1996-07-16 |
$20,361,000 |
| 5212537 |
Calibration technique for monochromators and spectrophotometers |
Monoocher Birang, Ronnie Northrup, Bruno Strul |
1993-05-18 |
$23,971,000 |
| 5129994 |
Method and apparatus to inhibit obstruction of optical transmission through semiconductor etch process chamber viewport |
Peter Ebbing, Jack Ford, Fred H. Hariz, Michael Sugarman |
1992-07-14 |
$2,979,000 |
