KC

Kien N. Chuc

Applied Materials: 23 patents #544 of 7,310Top 8%
Overall (All Time): #181,325 of 4,157,543Top 5%
23
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12146219 Flow control features of CVD chambers Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller, Soonam Park +5 more 2024-11-19
11512391 Process kit for a high throughput processing chamber Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Sungjin Kim, Yanjie Wang 2022-11-29
D946534 Radio frequency conduit Adam J. Fischbach, Canfeng Lai, Carlaton WONG 2022-03-22
11270905 Modulating film properties by optimizing plasma coupling materials Eswaranand Venkatasubramanian, Edward Haywood, Samuel E. Gottheim, Pramit Manna, Adam J. Fischbach +2 more 2022-03-08
11264213 Chemical control features in wafer process equipment Qiwei Liang, Xinglong Chen, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more 2022-03-01
10724138 Process kit for a high throughput processing chamber Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Sungjin Kim, Yanjie Wang 2020-07-28
10711347 Micro-volume deposition chamber Dale R. DuBois, Karthik Janakiraman 2020-07-14
10550472 Flow control features of CVD chambers Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller, Soonam Park +5 more 2020-02-04
10354843 Chemical control features in wafer process equipment Qiwei Liang, Xinglong Chen, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more 2019-07-16
10283321 Semiconductor processing system and methods using capacitively coupled plasma Jang-Gyoo Yang, Matthew L. Miller, Xinglong Chen, Qiwei Liang, Shankar Venkataraman +1 more 2019-05-07
10240234 Gas distribution apparatus for processing chambers Dale R. Du Bois, Karthik Janakiraman 2019-03-26
10113231 Process kit including flow isolator ring Dale R. DuBois, Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Yanjie Wang +1 more 2018-10-30
10017855 Process kit for a high throughput processing chamber Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Sungjin Kim, Yanjie Wang 2018-07-10
9978564 Chemical control features in wafer process equipment Qiwei Liang, Xinglong Chen, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more 2018-05-22
9144147 Semiconductor processing system and methods using capacitively coupled plasma Jang-Gyoo Yang, Matthew L. Miller, Xinglong Chen, Qiwei Liang, Shankar Venkataraman +1 more 2015-09-22
9132436 Chemical control features in wafer process equipment Qiwei Liang, Xinglong Chen, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more 2015-09-15
8894767 Flow control features of CVD chambers Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller, Soonam Park +5 more 2014-11-25
8771538 Plasma source design Dmitry Lubomirsky, Jang-Gyoo Yang, Matthew L. Miller, Jay D. Pinson, II 2014-07-08
8742665 Plasma source design Dmitry Lubomirsky, Jang-Gyoo Yang, Matthew L. Miller, Jay D. Pinson, II 2014-06-03
6401652 Plasma reactor inductive coil antenna with flat surface facing the plasma Jonathan D. Mohn, Arthur H. Sato 2002-06-11
5537508 Method and dry vapor generator channel assembly for conveying a liquid from a liquid source to a liquid vaporizer with minimal liquid stagnation Peter Ebbing 1996-07-16
5212537 Calibration technique for monochromators and spectrophotometers Monoocher Birang, Ronnie Northrup, Bruno Strul 1993-05-18
5129994 Method and apparatus to inhibit obstruction of optical transmission through semiconductor etch process chamber viewport Peter Ebbing, Jack Ford, Fred H. Hariz, Michael Sugarman 1992-07-14