| 11133210 |
Dual temperature heater |
Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Ganesh Balasubramanian, Lipyeow Yap, Jianhua Zhou +1 more |
2021-09-28 |
| 11031262 |
Loadlock integrated bevel etcher system |
Saptarshi Basu, Jeongmin Lee, Paul Connors, Prashant Kumar Kulshreshtha, Karthik Thimmavajjula Narasimha +12 more |
2021-06-08 |
| 11004663 |
Chamber design for semiconductor processing |
Juan Carlos Rocha-Alvarez, Amit Kumar BANSAL |
2021-05-11 |
| 10774423 |
Tunable ground planes in plasma chambers |
Karthik Janakiraman, Thomas Nowak, Juan Carlos Rocha-Alvarez, Mark Fodor, Amit Kumar BANSAL +4 more |
2020-09-15 |
| 10720349 |
Temperature measurement in multi-zone heater |
Bozhi Yang, Jianhua Zhou, Sanjeev Baluja, Amit Kumar BANSAL, Juan Carlos Rocha-Alvarez |
2020-07-21 |
| 10636684 |
Loadlock integrated bevel etcher system |
Saptarshi Basu, Jeongmin Lee, Paul Connors, Prashant Kumar Kulshreshtha, Karthik Thimmavajjula Narasimha +12 more |
2020-04-28 |
| 10570517 |
Apparatus and method for UV treatment, chemical treatment, and deposition |
Amit Kumar BANSAL, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Scott A. Hendrickson, Thomas Nowak |
2020-02-25 |
| 10527407 |
In-situ metrology method for thickness measurement during PECVD processes |
Khokan Chandra Paul, Edward W. Budiarto, Todd Egan, Mehdi Vaez-Iravani, Jeongmin Lee +1 more |
2020-01-07 |
| 10518418 |
Wafer swapper |
Juan Carlos Rocha-Alvarez, Karthik Janakiraman, Hari Ponnekanti, Sanjeev Baluja, Prajeeth Wilton |
2019-12-31 |
| 10480077 |
PEALD apparatus to enable rapid cycling |
Jianhua Zhou, Juan Carlos Rocha-Alvarez |
2019-11-19 |
| 10403515 |
Loadlock integrated bevel etcher system |
Saptarshi Basu, Jeongmin Lee, Paul Connors, Prashant Kumar Kulshreshtha, Karthik Thimmavajjula Narasimha +12 more |
2019-09-03 |
| 10325799 |
Dual temperature heater |
Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Ganesh Balasubramanian, Lipyeow Yap, Jianhua Zhou +1 more |
2019-06-18 |
| 10281261 |
In-situ metrology method for thickness measurement during PECVD processes |
Khokan Chandra Paul, Edward W. Budiarto, Todd Egan, Mehdi Vaez-Iravani, Jeongmin Lee +1 more |
2019-05-07 |
| 10240234 |
Gas distribution apparatus for processing chambers |
Kien N. Chuc, Karthik Janakiraman |
2019-03-26 |
| 10227695 |
Shadow ring for modifying wafer edge and bevel deposition |
Mohamad A. Ayoub, Robert W. Kim, Amit Kumar BANSAL, Mark Fodor, Binh Nguyen +6 more |
2019-03-12 |
| 10153185 |
Substrate temperature measurement in multi-zone heater |
Bozhi Yang, Jianhua Zhou, Sanjeev Baluja, Amit Kumar BANSAL, Juan Carlos Rocha-Alvarez |
2018-12-11 |
| 10094486 |
Method and system for supplying a cleaning gas into a process chamber |
Ramprakash Sankarakrishnan, Ganesh Balasubramanian, Karthik Janakiraman, Juan Carlos Rocha-Alvarez, Thomas Nowak +2 more |
2018-10-09 |
| 10023954 |
Slit valve apparatus, systems, and methods |
John Mazzocco, Juan Carlos Rocha-Alvarez |
2018-07-17 |
| 9922819 |
Wafer rotation in a semiconductor chamber |
Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Ramprakash Sankarakrishnan, Robert W. Kim, Kirby H. Floyd +2 more |
2018-03-20 |
| 9889567 |
Wafer swapper |
Juan Carlos Rocha-Alvarez, Karthik Janakiraman, Hari Ponnekanti, Sanjeev Baluja, Prajeeth Wilton |
2018-02-13 |
| 9593419 |
Wafer rotation in a semiconductor chamber |
Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Ramprakash Sankarakrishnan, Robert W. Kim, Kirby H. Floyd +2 more |
2017-03-14 |
| 9355876 |
Process load lock apparatus, lift assemblies, electronic device processing systems, and methods of processing substrates in load lock locations |
Paul B. Reuter, Ganesh Balasubramanian, JuanCarlos Rocha-Alvarez, Jeffrey Barrett Robinson, Paul Connors |
2016-05-31 |
| 9206511 |
Method and system for supplying a cleaning gas into a process chamber |
Ramprakash Sankarakrishnan, Ganesh Balasubramanian, Karthik Janakiraman, Juan Carlos Rocha-Alvarez, Thomas Nowak +2 more |
2015-12-08 |
| 8884524 |
Apparatus and methods for improving reliability of RF grounding |
Jianhua Zhou, Mohamad A. Ayoub, Juan Carlos Rocha-Alvarez |
2014-11-11 |
| 8778813 |
Confined process volume PECVD chamber |
Ramprakash Sankarakrishnan, Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Mark Fodor, Jianhua Zhou +6 more |
2014-07-15 |
