Issued Patents All Time
Showing 25 most recent of 83 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12347653 | Uniform in situ cleaning and deposition | Saket Rathi, Tuan Nguyen, Yuxing Zhang, Badri Narayan Ramamurthi, Nitin Pathak +2 more | 2025-07-01 |
| 12340984 | Radio frequency power return path | Luke Bonecutter, David Blahnik, Tuan Nguyen | 2025-06-24 |
| 12183553 | Baffle implementation for improving bottom purge gas flow uniformity | Nitin Pathak, Kartik Shah, Tuan Nguyen, Juan Carlos Rocha, David Blahnik | 2024-12-31 |
| 12110590 | Faceplate having a curved surface | Shailendra Srivastava, Sai Susmita Addepalli, Nikhil Sudhindrarao Jorapur, Daemian Raj Benjamin Raj, Juan Carlos Rocha-Alvarez +5 more | 2024-10-08 |
| 12087555 | Method and system for cleaning a process chamber | Kalyanjit Ghosh, Shailendra Srivastava, Tejas Ulavi, Yusheng Zhou, Sanjeev Baluja | 2024-09-10 |
| 12060637 | Actively cooled foreline trap to reduce throttle valve drift | Gaosheng Fu, Tuan Nguyen, Karthik Janakiraman, Juan Carlos Rocha-Alvarez | 2024-08-13 |
| 12050972 | Preservation of causal information for machine learning | Thomas Rosati, Tittu Thomas Nellimoottil | 2024-07-30 |
| 12012653 | Cleaning assemblies for substrate processing chambers | Yuxing Zhang, Tuan Nguyen, Nitin Pathak, Saket Rathi, Thomas Rubio +3 more | 2024-06-18 |
| 11952660 | Semiconductor processing chambers and methods for cleaning the same | Nitin Pathak, Yuxing Zhang, Tuan Nguyen, Kalyanjit Ghosh, Juan Carlos Rocha-Alvarez | 2024-04-09 |
| 11952663 | Hardware to prevent bottom purge incursion in application volume and process gas diffusion below heater | Nitin Pathak, Tuan Nguyen, Badri Narayan Ramamurthi, Thomas Rubio, Juan Carlos Rocha-Alvarez | 2024-04-09 |
| 11908662 | Device and method for tuning plasma distribution using phase control | Xiaopu Li, Kallol Bera, Edward P. Hammond, IV, Jonghoon Baek, Jun Ma +1 more | 2024-02-20 |
| 11898249 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2024-02-13 |
| 11862475 | Gas mixer to enable RPS purging | Fang Ruan, Diwakar Kedlaya, Venkata Sharat Chandra Parimi, Rajaram Narayanan, Badri Narayan Ramamurthi +3 more | 2024-01-02 |
| 11851759 | Faceplate having a curved surface | Shailendra Srivastava, Sai Susmita Addepalli, Nikhil Sudhindrarao Jorapur, Daemian Raj Benjamin Raj, Juan Carlos Rocha-Alvarez +5 more | 2023-12-26 |
| 11827980 | Isolator apparatus and methods for substrate processing chambers | Nitin Pathak, Tuan Nguyen, Thomas Rubio, Badri Narayan Ramamurthi, Juan Carlos Rocha-Alvarez | 2023-11-28 |
| 11742235 | Coaxial lift device with dynamic leveling | Jason M. Schaller, Jeffrey Blahnik | 2023-08-29 |
| 11742185 | Uniform in situ cleaning and deposition | Saket Rathi, Tuan Nguyen, Yuxing Zhang, Badri Narayan Ramamurthi, Nitin Pathak +2 more | 2023-08-29 |
| 11699577 | Treatment for high-temperature cleans | Sarah Michelle Bobek, Ruiyun Huang, Abdul Aziz Khaja, Dong-Hyung LEE, Ganesh Balasubramanian +6 more | 2023-07-11 |
| 11697877 | High temperature face plate for deposition application | Saket Rathi, Tuan Nguyen | 2023-07-11 |
| 11682544 | Cover wafer for semiconductor processing chamber | Venkata Sharat Chandra Parimi, Satish Radhakrishnan, Diwakar Kedlaya, Fang Ruan | 2023-06-20 |
| 11656366 | Apparatus, system and method for generalized multi-mode state machine based localization engine and application of same | Pengluo Wang, Hairuo Zhuang, Xue Li, Venkatesan Nallampatti Ekambaram, Vignesh Sethuraman | 2023-05-23 |
| 11643725 | Hardware to prevent bottom purge incursion in application volume and process gas diffusion below heater | Nitin Pathak, Tuan Nguyen, Badri Narayan Ramamurthi, Thomas Rubio, Juan Carlos Rocha-Alvarez | 2023-05-09 |
| 11613812 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2023-03-28 |
| 11580475 | Utilizing artificial intelligence to predict risk and compliance actionable insights, predict remediation incidents, and accelerate a remediation process | San Retna, Tushant Nayyar, Rithesh Mohan, Rimon Nissan, Jennifer Pham | 2023-02-14 |
| 11574825 | External substrate system rotation in a semiconductor processing system | Tuan Nguyen, Juan Carlos Rocha-Alvarez | 2023-02-07 |