Issued Patents All Time
Showing 25 most recent of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12198908 | Magnetically coupled RF filter for substrate processing chambers | Dmitry A. Dzilno, Alexander V. Garachtchenko | 2025-01-14 |
| 12136536 | Electrostatic chuck with multiple radio frequency meshes to control plasma uniformity | Jonghoon Baek | 2024-11-05 |
| 12136549 | Plasma-enhanced chemical vapor deposition of carbon hard-mask | Byung Seok KWON, Prashant Kumar Kulshreshtha, Kwangduk Douglas Lee, Bushra Afzal, Sungwon Ha +3 more | 2024-11-05 |
| 12094748 | Bipolar esc with balanced RF impedance | Jian Li, Juan Carlos Rocha-Alvarez, Dmitry A. Dzilno, Wenhao Zhang | 2024-09-17 |
| 11908662 | Device and method for tuning plasma distribution using phase control | Xiaopu Li, Kallol Bera, Jonghoon Baek, Amit Kumar BANSAL, Jun Ma +1 more | 2024-02-20 |
| 11776835 | Power supply signal conditioning for an electrostatic chuck | Zheng John Ye, Daemian Raj Benjamin Raj, Rana Howlader, Abhigyan Keshri, Sanjay Kamath +6 more | 2023-10-03 |
| 11699602 | Substrate support assemblies and components | Jian Li, Viren Kalsekar, Vidyadharan Srinivasa Murthy Bangalore, Juan Carlos Rocha-Alvarez | 2023-07-11 |
| 11626853 | RF power delivery architecture with switchable match and frequency tuning | Yury Trachuk, Dmitry A. Dzilno | 2023-04-11 |
| 11569072 | RF grounding configuration for pedestals | Satya THOKACHICHU, Viren Kalsekar, Zheng John Ye, Abdul Aziz Khaja, Vinay Prabhakar | 2023-01-31 |
| 11545376 | Plasma parameters and skew characterization by high speed imaging | Sidharth Bhatia, Bhaskar Kumar, Anup K. Singh, Vivek Shah, Ganesh Balasubramanian | 2023-01-03 |
| 11434569 | Ground path systems for providing a shorter and symmetrical ground path | Tuan Nguyen, Jason M. Schaller, David Blahnik, Tejas Ulavi, Amit Kumar BANSAL +3 more | 2022-09-06 |
| 11361940 | Push-pull power supply for multi-mesh processing chambers | — | 2022-06-14 |
| 10923334 | Selective deposition of hardmask | Satya THOKACHICHU, Viren Kalsekar, Zheng John Ye, Sarah Michelle Bobek, Abdul Aziz Khaja +4 more | 2021-02-16 |
| 10748797 | Plasma parameters and skew characterization by high speed imaging | Sidharth Bhatia, Bhaskar Kumar, Anup K. Singh, Vivek Shah, Ganesh Balasubramanian | 2020-08-18 |
| 10395893 | Dual-feed tunable plasma source | Tsutomu Tanaka, Anantha K. Subramani | 2019-08-27 |
| 10219638 | Refrigerated display appliances | Ian Wood | 2019-03-05 |
| 10109462 | Dual radio-frequency tuner for process control of a plasma process | Abdul Aziz Khaja, Tza-Jing Gung | 2018-10-23 |
| 9850576 | Anti-arc zero field plate | Jonghoon Baek, Edwin C. Suarez, Tsutomu Tanaka, Jeonghoon Oh | 2017-12-26 |
| 9788666 | Refrigerated display appliances | Ian Wood | 2017-10-17 |
| 9775448 | Refrigerated display appliances | Ian Wood | 2017-10-03 |
| 9265359 | Refrigerated display appliances | Ian Wood | 2016-02-23 |
| 8871064 | Electromagnet array in a sputter reactor | Tza-Jing Gung, Xinyu Fu, Arvind Sundarrajan, Praburam Gopalraja, John C. Forster +2 more | 2014-10-28 |
| 8236133 | Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias | Dan Katz, David Palagashvili, Brian K. Hatcher, Theodoros Panagopoulos, Valentin N. Todorow +2 more | 2012-08-07 |
| 8066895 | Method to control uniformity using tri-zone showerhead | Rodolfo P. Belen, Brian K. Hatcher, Dan Katz, Alexander Paterson, Valentin N. Todorow | 2011-11-29 |
| 8017526 | Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process | Rodolfo P. Belen, Alexander Paterson, Brian K. Hatcher, Valentin N. Todorow, Dan Katz | 2011-09-13 |