| 11322337 |
Plasma processing system workpiece carrier with thermally isolated heater plate blocks |
Dmitry Lubomirsky, Son T. Nguyen, Anh N. Nguyen |
2022-05-03 |
| 11302520 |
Chamber apparatus for chemical etching of dielectric materials |
Tien Fak Tan, Dmitry Lubomirsky, Kirby H. Floyd, Son T. Nguyen, Alexander Tam +1 more |
2022-04-12 |
| 10083816 |
Shielded lid heater assembly |
Michael D. Willwerth, Valentin N. Todorow, Stephen Yuen |
2018-09-25 |
| 9639097 |
Component temperature control by coolant flow control and heater duty cycle control |
Chetan Mahadeswaraswamy, Kartik Ramaswamy, Bryan Liao, Sergio Fukuda Shoji, Duy D. Nguyen +1 more |
2017-05-02 |
| 9443753 |
Apparatus for controlling the flow of a gas in a process chamber |
Michael D. Willwerth, Jingbao Liu |
2016-09-13 |
| 9362148 |
Shielded lid heater assembly |
Michael D. Willwerth, Valentin N. Todorow, Stephen Yuen |
2016-06-07 |
| 9070536 |
Plasma reactor electrostatic chuck with cooled process ring and heated workpiece support surface |
Michael D. Willwerth, Michael G. Chafin, Ying-Sheng Lin |
2015-06-30 |
| 8880227 |
Component temperature control by coolant flow control and heater duty cycle control |
Chetan Mahadeswaraswamy, Kartik Ramaswamy, Bryan Liao, Sergio Fukuda Shoji, Duy D. Nguyen +1 more |
2014-11-04 |
| 8840725 |
Chamber with uniform flow and plasma distribution |
Michael D. Willwerth, ALEX ERENSTEIN, Jingbao Liu |
2014-09-23 |
| 8757603 |
Low force substrate lift |
Michael D. Willwerth |
2014-06-24 |
| 8580693 |
Temperature enhanced electrostatic chucking in plasma processing apparatus |
Sergey G. Belostotskiy, Michael G. Chafin, Jingbao Liu |
2013-11-12 |
| 8501626 |
Methods for high temperature etching a high-K material gate structure |
Wei Liu, Eiichi Matsusue, Meihua Shen, Shashank Deshmukh, Anh Phan +4 more |
2013-08-06 |
| 8419893 |
Shielded lid heater assembly |
Michael D. Willwerth, Valentin N. Todorow, Stephen Yuen |
2013-04-16 |
| 8383002 |
Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection |
Dan Katz, Michael D. Willwerth, Valentin N. Todorow, Alexander Paterson |
2013-02-26 |
| 8270141 |
Electrostatic chuck with reduced arcing |
Michael D. Willwerth, Douglas A. Buchberger, Jr., Michael G. Chafin |
2012-09-18 |
| 8236133 |
Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias |
Dan Katz, Brian K. Hatcher, Theodoros Panagopoulos, Valentin N. Todorow, Edward P. Hammond, IV +2 more |
2012-08-07 |
| 7879250 |
Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection |
Dan Katz, Michael D. Willwerth, Valentin N. Todorow, Alexander Paterson |
2011-02-01 |
| 7832354 |
Cathode liner with wafer edge gas injection in a plasma reactor chamber |
Dan Katz, Michael D. Willwerth, Valentin N. Todorow, Alexander Paterson |
2010-11-16 |
| 7552736 |
Process for wafer backside polymer removal with a ring of plasma under the wafer |
Kenneth S. Collins, Hiroji Hanawa, Andrew Nguyen, Ajit Balakrishna, James P. Cruse +7 more |
2009-06-30 |
| 6962644 |
Tandem etch chamber plasma processing system |
Alexander Paterson, Valentin Todorov, Jon McChesney, Gerhard Schneider, John Holland +1 more |
2005-11-08 |
| 6818096 |
Plasma reactor electrode |
Michael Barnes |
2004-11-16 |
| 6692903 |
Substrate cleaning apparatus and method |
Haojiang Chen, James S. Papanu, Mark Kawaguchi, Harald Herchen, Jeng H. Hwang +1 more |
2004-02-17 |
| 6444040 |
Gas distribution plate |
Harald Herchen, Dmitry Lubomirsky, Alex Schreiber |
2002-09-03 |
| 6369493 |
Microwave plasma applicator having a thermal transfer medium between a plasma containing tube and a cooling jacket |
Dmitry Lubomirsky, Harald Herchen, Simon Yavelberg, Donald Olgado |
2002-04-09 |
| 6120608 |
Workpiece support platen for semiconductor process chamber |
Norman Shendon, James S. Papanu |
2000-09-19 |
