| RE44491 |
Chemical mechanical polishing retaining ring |
Michael Sherwood, Harry Q. Lee |
2013-09-10 |
| 8079894 |
Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion |
Robert D. Tolles, Sasson Somekh, Ilya Perlov, Eugene Gantvarg, Harry Q. Lee |
2011-12-20 |
| 7614939 |
Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion |
Robert D. Tolles, Sasson Somekh, Ilya Perlov, Eugene Gantvarg, Harry Q. Lee |
2009-11-10 |
| 7101261 |
Fluid-pressure regulated wafer polishing head |
Michael Sherwood, Harry Q. Lee |
2006-09-05 |
| 6716094 |
Chemical mechanical polishing retaining ring |
Michael Sherwood, Harry Q. Lee |
2004-04-06 |
| 6652368 |
Chemical mechanical polishing carrier head |
Michael Sherwood, Harry Q. Lee |
2003-11-25 |
| 6513848 |
Hydraulically actuated wafer clamp |
John Hearne, Bryan Von Lossberg |
2003-02-04 |
| 6443824 |
Fluid-pressure regulated wafer polishing head |
Michael Sherwood, Harry Q. Lee |
2002-09-03 |
| 6290577 |
Fluid pressure regulated wafer polishing head |
Michael Sherwood, Harry Q. Lee |
2001-09-18 |
| 6120608 |
Workpiece support platen for semiconductor process chamber |
James S. Papanu, David Palagashvili |
2000-09-19 |
| 6024630 |
Fluid-pressure regulated wafer polishing head |
Michael Sherwood, Harry Q. Lee |
2000-02-15 |
| 5775983 |
Apparatus and method for conditioning a chemical mechanical polishing pad |
William R. Bartlett |
1998-07-07 |
| 5624299 |
Chemical mechanical polishing apparatus with improved carrier and method of use |
— |
1997-04-29 |
