Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10361091 | Porous low-k dielectric etch | Eric A. Hudson, Sonny Li, Chia-Chun Wang, Prabhakara Gopaladasu, Zihao Ouyang | 2019-07-23 |
| 9396961 | Integrated etch/clean for dielectric etch applications | Reza Arghavani, Eric A. Hudson, Tom A. Kamp, Samantha Tan, Gerardo Delgadino | 2016-07-19 |
| 9079228 | Methodology for cleaning of surface metal contamination from an upper electrode used in a plasma chamber | Hong Shih, Armen Avoyan, David Carman | 2015-07-14 |
| 8956500 | Methods to eliminate “M-shape” etch rate profile in inductively coupled plasma reactor | Stephen Yuen, Kyeong-Tae Lee, Valentin N. Todorow, Tae Won Kim, Anisul Khan | 2015-02-17 |
| 8722547 | Etching high K dielectrics with high selectivity to oxide containing layers at elevated temperatures with BC13 based etch chemistries | Radhika Mani, Nicolas Gani, Wei Liu, Meihua Shen | 2014-05-13 |
| 8501626 | Methods for high temperature etching a high-K material gate structure | Wei Liu, Eiichi Matsusue, Meihua Shen, Anh Phan, David Palagashvili +4 more | 2013-08-06 |
| 8133817 | Shallow trench isolation etch process | Hiroki Sasano, Meihua Shen, Radhika Mani, Sunil Srinivasan, Daehee Weon +2 more | 2012-03-13 |
| 7910488 | Alternative method for advanced CMOS logic gate etch applications | Nicolas Gani, Meihua Shen | 2011-03-22 |
| 7780862 | Device and method for etching flash memory gate stacks comprising high-k dielectric | Meihua Shen, Xikun Wang, Wei Liu, Yan Du | 2010-08-24 |
| 7771606 | Pulsed-plasma system with pulsed reaction gas replenish for etching semiconductors structures | Tae Won Kim, Kyeong-Tae Lee, Alexander Paterson, Valentin N. Todorow | 2010-08-10 |
| 7754610 | Process for etching tungsten silicide overlying polysilicon particularly in a flash memory | Kyeong-Tae Lee, Jinhan Choi, Bi Jang, Meihua Shen, Thorsten Lill +1 more | 2010-07-13 |
| 7737042 | Pulsed-plasma system for etching semiconductor structures | Tae Won Kim, Kyeong-Tae Lee, Alexander Paterson, Valentin N. Todorow | 2010-06-15 |
| 7718538 | Pulsed-plasma system with pulsed sample bias for etching semiconductor substrates | Tae Won Kim, Kyeong-Tae Lee, Alexander Paterson, Valentin Todorov | 2010-05-18 |
| 7504338 | Method of pattern etching a silicon-containing hard mask | Yan Du, Meihua Shen | 2009-03-17 |
| 7368392 | Method of fabricating a gate structure of a field effect transistor having a metal-containing gate electrode | Jinhan Choi, Sang In Yi, Kyeong-Tae Lee | 2008-05-06 |
| 7122125 | Controlled polymerization on plasma reactor wall | Thorsten Lill | 2006-10-17 |
| 6924088 | Method and system for realtime CD microloading control | David Mui, Wei Liu, Hiroki Sasano | 2005-08-02 |
| 6921723 | Etching method having high silicon-to-photoresist selectivity | Yung-Hee Yvette Lee | 2005-07-26 |
| 6653237 | High resist-selectivity etch for silicon trench etch applications | David Mui, Jeffrey D. Chinn, Dragan Podlesnik | 2003-11-25 |
| 6402974 | Method for etching polysilicon to have a smooth surface | Jitske Trevor, Jeff Chinn | 2002-06-11 |
| 6235214 | Plasma etching of silicon using fluorinated gas mixtures | Jeffrey D. Chinn | 2001-05-22 |
| 5978202 | Electrostatic chuck having a thermal transfer regulator pad | Ralph Wadensweiler, Ajay Kumar, Weinan Jiang, Rolf Guenther | 1999-11-02 |
| 5893643 | Apparatus for measuring pedestal temperature in a semiconductor wafer processing system | Ajay Kumar, Jeffrey D. Chinn, Weinan Jiang, Brian Duda, Rolf Guenther +3 more | 1999-04-13 |
| 5851926 | Method for etching transistor gates using a hardmask | Ajay Kumar, Jeffrey D. Chinn, Weinan Jiang, Rolf Guenther, Bruce Minaee +1 more | 1998-12-22 |