Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9633846 | Internal plasma grid applications for semiconductor fabrication | Alex Paterson, Do-Young Kim, Gowri Kamarthy, Helene Del Puppo, Jen-Kan Yu +5 more | 2017-04-25 |
| 9533332 | Methods for in-situ chamber clean utilized in an etching processing chamber | Noel Sun, Meihua Shen, Chung Liu, Radhika Mani | 2017-01-03 |
| 9305797 | Polysilicon over-etch using hydrogen diluted plasma for three-dimensional gate etch | Radhika Mani | 2016-04-05 |
| 9230819 | Internal plasma grid applications for semiconductor fabrication in context of ion-ion plasma processing | Alex Paterson, Do-Young Kim, Gowri Kamarthy, Helene Del Puppo, Jen-Kan Yu +5 more | 2016-01-05 |
| 8722547 | Etching high K dielectrics with high selectivity to oxide containing layers at elevated temperatures with BC13 based etch chemistries | Radhika Mani, Wei Liu, Meihua Shen, Shashank Deshmukh | 2014-05-13 |
| 8133817 | Shallow trench isolation etch process | Hiroki Sasano, Meihua Shen, Radhika Mani, Sunil Srinivasan, Daehee Weon +2 more | 2012-03-13 |
| 8101525 | Method for fabricating a semiconductor device having a lanthanum-family-based oxide layer | Meihua Shen, Noel Sun, Han-Hsiang Chen, Eric Pei, Weimin Zeng +3 more | 2012-01-24 |
| 7910488 | Alternative method for advanced CMOS logic gate etch applications | Meihua Shen, Shashank Deshmukh | 2011-03-22 |
| 7648914 | Method for etching having a controlled distribution of process results | Thomas J. Kropewnicki, Theodoros Panagopoulos, Wilfred Pau, Meihua Shen, John Holland | 2010-01-19 |
| 7436645 | Method and apparatus for controlling temperature of a substrate | John Holland, Theodoros Panagopoulos, Alexander Matyushkin, Dan Katz, Michael F. Hegarty +1 more | 2008-10-14 |
| 6933243 | High selectivity and residue free process for metal on thin dielectric gate etch application | Meihua Shen, Yan Du, Oranna Yauw, Hakeem Oluseyi | 2005-08-23 |
| 6818562 | Method and apparatus for tuning an RF matching network in a plasma enhanced semiconductor wafer processing system | Valentin N. Todorow, John Holland | 2004-11-16 |
| 6599437 | Method of etching organic antireflection coating (ARC) layers | Oranna Yauw, Meihua Shen, Jeffrey D. Chinn | 2003-07-29 |