Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12253190 | Non-elastomeric, non-polymeric, non-metallic membrane valves for semiconductor processing equipment | Mariusch Gregor, Thorsten Lill | 2025-03-18 |
| 11796085 | Non-elastomeric, non-polymeric, non-metallic membrane valves for semiconductor processing equipment | Mariusch Gregor, Thorsten Lill | 2023-10-24 |
| 11380556 | Thermal atomic layer etch with rapid temperature cycling | Andreas Fischer, Thorsten Lill | 2022-07-05 |
| 10257887 | Substrate support assembly | Alexander Matyushkin, Dan Katz, John Holland, Michael D. Willwerth | 2019-04-09 |
| 10153282 | Ultra-high vacuum transport and storage | Richard H. Gould, Edmundo Reyes, John D. Boniface, Ivan L. Berry, III, Alexander Dulkin +1 more | 2018-12-11 |
| 9883549 | Substrate support assembly having rapid temperature control | Alexander Matyushkin, Dan Katz, John Holland, Michael D. Willwerth | 2018-01-30 |
| 9275887 | Substrate processing with rapid temperature gradient control | Alexander Matyushkin, Dan Katz, John Holland, Michael D. Willwerth | 2016-03-01 |
| 8663391 | Electrostatic chuck having a plurality of heater coils | Alexander Matyushkin, Dennis Koosau, John Holland | 2014-03-04 |
| 8236133 | Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias | Dan Katz, David Palagashvili, Brian K. Hatcher, Valentin N. Todorow, Edward P. Hammond, IV +2 more | 2012-08-07 |
| 8226769 | Substrate support with electrostatic chuck having dual temperature zones | Alexander Matyushkin, Dennis Koosau, John Holland | 2012-07-24 |
| 8075729 | Method and apparatus for controlling temperature of a substrate | John Holland | 2011-12-13 |
| 7838430 | Plasma control using dual cathode frequency mixing | Steven C. Shannon, Dennis S. Grimard, Daniel J. Hoffman, Michael G. Chafin, Troy S. Detrick +4 more | 2010-11-23 |
| 7780864 | Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution | Alexander Paterson, Valentin N. Todorow, Brian K. Hatcher, Dan Katz, Edward P. Hammond, IV +2 more | 2010-08-24 |
| 7727413 | Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density | Alexander Paterson, Valentin N. Todorow, Brian K. Hatcher, Dan Katz, Edward P. Hammond, IV +2 more | 2010-06-01 |
| 7674394 | Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution | Alexander Paterson, Valentin Todorov, Brian K. Hatcher, Dan Katz, Edward P. Hammond, IV +1 more | 2010-03-09 |
| 7648914 | Method for etching having a controlled distribution of process results | Thomas J. Kropewnicki, Nicolas Gani, Wilfred Pau, Meihua Shen, John Holland | 2010-01-19 |
| 7645357 | Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency | Alexander Paterson, Valentin N. Todorow, Brian K. Hatcher, Dan Katz, Edward P. Hammond, IV +2 more | 2010-01-12 |
| 7544251 | Method and apparatus for controlling temperature of a substrate | John Holland | 2009-06-09 |
| 7510665 | Plasma generation and control using dual frequency RF signals | Steven C. Shannon, Alexander Paterson, John Holland, Dennis S. Grimard, Daniel J. Hoffman | 2009-03-31 |
| 7436645 | Method and apparatus for controlling temperature of a substrate | John Holland, Alexander Matyushkin, Dan Katz, Michael F. Hegarty, Denis M. Koosau +1 more | 2008-10-14 |
| 7431857 | Plasma generation and control using a dual frequency RF source | Steven C. Shannon, Alex Paterson, John Holland, Dennis S. Grimard, Yashushi Takakura | 2008-10-07 |
| 7264688 | Plasma reactor apparatus with independent capacitive and toroidal plasma sources | Alexander Paterson, Valentin N. Todorow, Brian K. Hatcher, Dan Katz, Edward P. Hammond, IV +2 more | 2007-09-04 |
| 6905968 | Process for selectively etching dielectric layers | Chang-Lin Hsieh, Jie Yuan, Hui Chen, Yan Ye | 2005-06-14 |