| 8878926 |
Apparatus and method for analyzing thermal properties of composite structures |
Zheng John Ye, Kartik Ramaswamy, Kenneth S. Collins |
2014-11-04 |
| 8080479 |
Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more |
2011-12-20 |
| 8076247 |
Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more |
2011-12-13 |
| 7988815 |
Plasma reactor with reduced electrical skew using electrical bypass elements |
Shahid Rauf, Kenneth S. Collins, Kallol Bera, Kartik Ramaswamy, Hiroji Hanawa +5 more |
2011-08-02 |
| 7968469 |
Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more |
2011-06-28 |
| 7884025 |
Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more |
2011-02-08 |
| 7879731 |
Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more |
2011-02-01 |
| 7838430 |
Plasma control using dual cathode frequency mixing |
Steven C. Shannon, Dennis S. Grimard, Theodoros Panagopoulos, Daniel J. Hoffman, Michael G. Chafin +4 more |
2010-11-23 |
| 6182602 |
Inductively coupled HDP-CVD reactor |
Fred C. Redeker, Romuald Nowak, Tetsuya Ishikawa, Jay D. Pinson, II |
2001-02-06 |
| 6083344 |
Multi-zone RF inductively coupled source configuration |
Hiroji Hanawa, Tetsuya Ishikawa, Manus Wong, Shijian Li, Kaveh Niazi +3 more |
2000-07-04 |
