Issued Patents All Time
Showing 25 most recent of 110 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11276562 | Plasma processing using multiple radio frequency power feeds for improved uniformity | Zheng John Ye, Ganesh Balasubramanian, Thuy Britcher, Jay D. Pinson, II, Juan Carlos Rocha-Alvarez +4 more | 2022-03-15 |
| 10580623 | Plasma processing using multiple radio frequency power feeds for improved uniformity | Zheng John Ye, Ganesh Balasubramanian, Thuy Britcher, Jay D. Pinson, II, Juan Carlos Rocha-Alvarez +4 more | 2020-03-03 |
| 10460915 | Rotatable substrate support having radio frequency applicator | Satoru Kobayashi, Kirby H. Floyd, Soonam Park, Dmitry Lubomirsky | 2019-10-29 |
| 10403535 | Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system | Zheng John Ye, Jay D. Pinson, II, Jianhua Zhou, Xing Lin, Ren-Guan Duan +11 more | 2019-09-03 |
| 9305749 | Methods of directing magnetic fields in a plasma source, and associated systems | Zheng John Ye, Jay D. Pinson, II, Juan Carlos Rocha-Alvarez | 2016-04-05 |
| 8980379 | Gas distribution showerhead and method of cleaning | Kyawwin Jason Maung, Hua Chung | 2015-03-17 |
| 8970226 | In-situ VHF current sensor for a plasma reactor | Satoru Kobayashi, Kartik Ramaswamy, Shahid Rauf | 2015-03-03 |
| 8910644 | Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas | Hua Chung, Xizi Dong, Kyawwin Jason Maung, Sang Won Kang, David H. Quach +6 more | 2014-12-16 |
| 8900405 | Plasma immersion ion implantation reactor with extended cathode process ring | Peter I. Porshnev, Majeed A. Foad, Kartik Ramaswamy, Biagio Gallo, Andrew Nguyen +2 more | 2014-12-02 |
| 8709924 | Method for conformal plasma immersed ion implantation assisted by atomic layer deposition | Seon-Mee Cho, Majeed A. Foad | 2014-04-29 |
| 8578879 | Apparatus for VHF impedance match tuning | Kartik Ramaswamy, Kenneth S. Collins, Lawrence Wong, Samer Banna, Andrew Nguyen | 2013-11-12 |
| 8513939 | In-situ VHF voltage sensor for a plasma reactor | Satoru Kobayashi, Kartik Ramaswamy, Shahid Rauf | 2013-08-20 |
| 8455374 | Radiation heating efficiency by increasing optical absorption of a silicon containing material | Kyawwin Jason Maung | 2013-06-04 |
| 8360003 | Plasma reactor with uniform process rate distribution by improved RF ground return path | Andrew Nguyen, Kartik Ramaswamy, Samer Banna, Anchel Sheyner, Valentin N. Todorow | 2013-01-29 |
| 8279577 | Substrate support having fluid channel | Andrew Nguyen, Wing Cheng, Semyon L. Kats, Kartik Ramaswamy, Yan Ye +4 more | 2012-10-02 |
| D664170 | Cleaning plate for inducing turbulent flow of a processing chamber cleaning glass | Hua Chung, Xizi Dong, Kyawwin Jason Maung, Sang Won Kang, David H. Quach +6 more | 2012-07-24 |
| 8168519 | Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces | Shijian Li, Kartik Ramaswamy, Seon-Mee Cho, Biagio Gallo, Dongwon Choi +1 more | 2012-05-01 |
| 8148977 | Apparatus for characterizing a magnetic field in a magnetically enhanced substrate processing system | Kartik Ramaswamy, Lawrence Wong, Chinh Dinh | 2012-04-03 |
| 8080479 | Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator | Kenneth S. Collins, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf, Kallol Bera +10 more | 2011-12-20 |
| 8076247 | Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes | Kenneth S. Collins, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf, Kallol Bera +10 more | 2011-12-13 |
| 8058156 | Plasma immersion ion implantation reactor having multiple ion shower grids | Tsutomu Tanaka, Kenneth S. Collins, Amir Al-Bayati, Kartik Ramaswamy, Andrew Nguyen | 2011-11-15 |
| 7989329 | Removal of surface dopants from a substrate | Kartik Ramaswamy, Kenneth S. Collins, Biagio Gallo, Majeed A. Foad, Martin A. Hilkene +2 more | 2011-08-02 |
| 7988815 | Plasma reactor with reduced electrical skew using electrical bypass elements | Shahid Rauf, Kenneth S. Collins, Kallol Bera, Kartik Ramaswamy, Andrew Nguyen +5 more | 2011-08-02 |
| 7972469 | Plasma processing apparatus | Andrew Nguyen, Keiji Horioka, Kallol Bera, Kenneth S. Collins, Lawrence Wong +3 more | 2011-07-05 |
| 7968469 | Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity | Kenneth S. Collins, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf, Kallol Bera +10 more | 2011-06-28 |