Issued Patents All Time
Showing 25 most recent of 47 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11522059 | Metallic sealants in transistor arrangements | Abhishek A. Sharma, Tahir Ghani, Jack T. Kavalieros, Gilbert Dewey, Van H. Le +1 more | 2022-12-06 |
| 11444205 | Contact stacks to reduce hydrogen in thin film transistor | Arnab Sen Gupta, Matthew V. Metz, Benjamin Chu-Kung, Abhishek A. Sharma, Van H. Le +7 more | 2022-09-13 |
| 10957518 | Chamber with individually controllable plasma generation regions for a reactor for processing a workpiece | Kartik Ramaswamy, Steven Lane, Yang Yang, Srinivas D. Nemani, Praburam Gopalraja | 2021-03-23 |
| 10784085 | Plasma processing reactor with a magnetic electron-blocking filter external of the chamber and uniform field within the chamber | Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Yang Yang | 2020-09-22 |
| 10656194 | Real-time measurement of a surface charge profile of an electrostatic chuck | Haitao Wang, Kartik Ramaswamy, Chunlei Zhang | 2020-05-19 |
| 10395904 | Method of real time in-situ chamber condition monitoring using sensors and RF communication | Kartik Ramaswamy, Yang Yang, Steven Lane, Richard Fovell | 2019-08-27 |
| 10153139 | Multiple electrode substrate support assembly and phase control system | Yang Yang, Kartik Ramaswamy, Steven Lane, Shahid Rauf, Andrew Nguyen +2 more | 2018-12-11 |
| 10141166 | Method of real time in-situ chamber condition monitoring using sensors and RF communication | Kartik Ramaswamy, Yang Yang, Steven Lane, Richard Fovell | 2018-11-27 |
| 10017857 | Method and apparatus for controlling plasma near the edge of a substrate | Andrew Nguyen, Yang Yang, Kartik Ramaswamy, Steven Lane | 2018-07-10 |
| 9659751 | System and method for selective coil excitation in inductively coupled plasma processing reactors | Kartik Ramaswamy, Yang Yang, Steven Lane, Joseph AuBuchon, Travis Koh | 2017-05-23 |
| 9472379 | Method of multiple zone symmetric gas injection for inductively coupled plasma | Steven Lane, Yang Yang, Kartik Ramaswamy | 2016-10-18 |
| 9412563 | Spatially discrete multi-loop RF-driven plasma source having plural independent zones | Kartik Ramaswamy, Kenneth S. Collins, Shahid Rauf, Steven Lane, Yang Yang | 2016-08-09 |
| 9240552 | Carbon nanotube semiconductor devices and deterministic nanofabrication methods | Scott B. Clendenning, David J. Michalak | 2016-01-19 |
| 9161428 | Independent control of RF phases of separate coils of an inductively coupled plasma reactor | Kenneth S. Collins, Satoru Kobayashi, Jonathan Liu, Yang Yang, Kartik Ramaswamy +1 more | 2015-10-13 |
| 8734664 | Method of differential counter electrode tuning in an RF plasma reactor | Yang Yang, Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Douglas A. Buchberger, Jr. +1 more | 2014-05-27 |
| 8578879 | Apparatus for VHF impedance match tuning | Kartik Ramaswamy, Hiroji Hanawa, Kenneth S. Collins, Samer Banna, Andrew Nguyen | 2013-11-12 |
| 8148977 | Apparatus for characterizing a magnetic field in a magnetically enhanced substrate processing system | Kartik Ramaswamy, Hiroji Hanawa, Chinh Dinh | 2012-04-03 |
| 8080479 | Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-12-20 |
| 8076247 | Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-12-13 |
| 7988815 | Plasma reactor with reduced electrical skew using electrical bypass elements | Shahid Rauf, Kenneth S. Collins, Kallol Bera, Kartik Ramaswamy, Hiroji Hanawa +5 more | 2011-08-02 |
| 7972469 | Plasma processing apparatus | Hiroji Hanawa, Andrew Nguyen, Keiji Horioka, Kallol Bera, Kenneth S. Collins +3 more | 2011-07-05 |
| 7968469 | Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-06-28 |
| 7884025 | Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-02-08 |
| 7879731 | Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-02-01 |
| 7587458 | Delta code messaging | — | 2009-09-08 |