| 11522059 |
Metallic sealants in transistor arrangements |
Abhishek A. Sharma, Tahir Ghani, Jack T. Kavalieros, Gilbert Dewey, Van H. Le +1 more |
2022-12-06 |
$14,727,000 |
| 11444205 |
Contact stacks to reduce hydrogen in thin film transistor |
Arnab Sen Gupta, Matthew V. Metz, Benjamin Chu-Kung, Abhishek A. Sharma, Van H. Le +7 more |
2022-09-13 |
$14,653,000 |
| 10957518 |
Chamber with individually controllable plasma generation regions for a reactor for processing a workpiece |
Kartik Ramaswamy, Steven Lane, Yang Yang, Srinivas D. Nemani, Praburam Gopalraja |
2021-03-23 |
$48,969,000 |
| 10784085 |
Plasma processing reactor with a magnetic electron-blocking filter external of the chamber and uniform field within the chamber |
Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Yang Yang |
2020-09-22 |
$43,360,000 |
| 10656194 |
Real-time measurement of a surface charge profile of an electrostatic chuck |
Haitao Wang, Kartik Ramaswamy, Chunlei Zhang |
2020-05-19 |
$40,373,000 |
| 10395904 |
Method of real time in-situ chamber condition monitoring using sensors and RF communication |
Kartik Ramaswamy, Yang Yang, Steven Lane, Richard Fovell |
2019-08-27 |
$34,720,000 |
| 10153139 |
Multiple electrode substrate support assembly and phase control system |
Yang Yang, Kartik Ramaswamy, Steven Lane, Shahid Rauf, Andrew Nguyen +2 more |
2018-12-11 |
$26,076,000 |
| 10141166 |
Method of real time in-situ chamber condition monitoring using sensors and RF communication |
Kartik Ramaswamy, Yang Yang, Steven Lane, Richard Fovell |
2018-11-27 |
$52,277,000 |
| 10017857 |
Method and apparatus for controlling plasma near the edge of a substrate |
Andrew Nguyen, Yang Yang, Kartik Ramaswamy, Steven Lane |
2018-07-10 |
$35,896,000 |
| 9659751 |
System and method for selective coil excitation in inductively coupled plasma processing reactors |
Kartik Ramaswamy, Yang Yang, Steven Lane, Joseph AuBuchon, Travis Koh |
2017-05-23 |
$22,760,000 |
| 9472379 |
Method of multiple zone symmetric gas injection for inductively coupled plasma |
Steven Lane, Yang Yang, Kartik Ramaswamy |
2016-10-18 |
$11,711,000 |
| 9412563 |
Spatially discrete multi-loop RF-driven plasma source having plural independent zones |
Kartik Ramaswamy, Kenneth S. Collins, Shahid Rauf, Steven Lane, Yang Yang |
2016-08-09 |
$15,983,000 |
| 9240552 |
Carbon nanotube semiconductor devices and deterministic nanofabrication methods |
Scott B. Clendenning, David J. Michalak |
2016-01-19 |
$21,016,000 |
| 9161428 |
Independent control of RF phases of separate coils of an inductively coupled plasma reactor |
Kenneth S. Collins, Satoru Kobayashi, Jonathan Liu, Yang Yang, Kartik Ramaswamy +1 more |
2015-10-13 |
$9,629,000 |
| 8734664 |
Method of differential counter electrode tuning in an RF plasma reactor |
Yang Yang, Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Douglas A. Buchberger, Jr. +1 more |
2014-05-27 |
$21,248,000 |
| 8578879 |
Apparatus for VHF impedance match tuning |
Kartik Ramaswamy, Hiroji Hanawa, Kenneth S. Collins, Samer Banna, Andrew Nguyen |
2013-11-12 |
$7,355,000 |
| 8148977 |
Apparatus for characterizing a magnetic field in a magnetically enhanced substrate processing system |
Kartik Ramaswamy, Hiroji Hanawa, Chinh Dinh |
2012-04-03 |
$7,743,000 |
| 8080479 |
Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more |
2011-12-20 |
$23,410,000 |
| 8076247 |
Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more |
2011-12-13 |
$5,494,000 |
| 7988815 |
Plasma reactor with reduced electrical skew using electrical bypass elements |
Shahid Rauf, Kenneth S. Collins, Kallol Bera, Kartik Ramaswamy, Hiroji Hanawa +5 more |
2011-08-02 |
$5,317,000 |
| 7972469 |
Plasma processing apparatus |
Hiroji Hanawa, Andrew Nguyen, Keiji Horioka, Kallol Bera, Kenneth S. Collins +3 more |
2011-07-05 |
$5,297,000 |
| 7968469 |
Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more |
2011-06-28 |
$3,915,000 |
| 7884025 |
Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more |
2011-02-08 |
$15,045,000 |
| 7879731 |
Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more |
2011-02-01 |
$7,897,000 |
| 7587458 |
Delta code messaging |
— |
2009-09-08 |
$13,115,000 |
