Issued Patents All Time
Showing 1–25 of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8936696 | Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor | Roger Alan Lindley, Jingbao Liu, Bryan Pu | 2015-01-20 |
| 8617351 | Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction | Daniel J. Hoffman, Roger Alan Lindley, Michael Kutney, Martin Jeff Salinas, Hamid Tavassoli +1 more | 2013-12-31 |
| 7972469 | Plasma processing apparatus | Hiroji Hanawa, Andrew Nguyen, Kallol Bera, Kenneth S. Collins, Lawrence Wong +3 more | 2011-07-05 |
| 7879186 | Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor | Roger Alan Lindley, Jingbao Liu, Bryan Pu | 2011-02-01 |
| 7846849 | Frequency tripling using spacer mask having interposed regions | Christopher Dennis Bencher | 2010-12-07 |
| 7807578 | Frequency doubling using spacer mask | Christopher Dennis Bencher | 2010-10-05 |
| 7575007 | Chamber recovery after opening barrier over copper | Hairong Tang, Xiaoye Zhao, Jeremiah T. Pender | 2009-08-18 |
| 7422654 | Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor | Roger Alan Lindley, Jingbao Liu, Bryan Pu | 2008-09-09 |
| 7374636 | Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor | Chun Yan, Taeho Shin, Roger Alan Lindley, Panyin Hughes, Douglas H. Burns +4 more | 2008-05-20 |
| 7316199 | Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber | Chun Yan, Taeho Shin, Roger Alan Lindley, Qi Li, Panyin Hughes +3 more | 2008-01-08 |
| 7196283 | Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface | Douglas A. Buchberger, Jr., Daniel J. Hoffman, Olga Regelman, James D. Carducci, Jang-Gyoo Yang | 2007-03-27 |
| 6800213 | Precision dielectric etch using hexafluorobutadiene | Ji Ding, Hidehiro Kojiri, Yoshio Ishikawa, Ruiping Wang, Robert Wu +1 more | 2004-10-05 |
| 6461533 | Etchant for silicon oxide and method | Yasuhiro Horiike, Yoshio Ishikawa | 2002-10-08 |
| 6432318 | Dielectric etch process reducing striations and maintaining critical dimensions | Ji Ding, Hidehiro Kojiri, Yoshio Ishikawa, Ruiping Wang, Robert Wu +1 more | 2002-08-13 |
| 6261428 | Magnetron plasma process apparatus | Toshihisa Nozawa, Isahiro Hasegawa | 2001-07-17 |
| 6132551 | Inductive RF plasma reactor with overhead coil and conductive laminated RF window beneath the overhead coil | Haruo Okano | 2000-10-17 |
| 5888338 | Magnetron plasma processing apparatus and processing method | Hiromi Harada, Sinji Kubota, Hiromi Kumagai, Junichi Arami, Isahiro Hasegawa +3 more | 1999-03-30 |
| 5733713 | Method of manufacturing semiconductor device | Hiroyuki Yano, Haruo Okano, Tohru Watanabe | 1998-03-31 |
| 5717294 | Plasma process apparatus | Itsuko Sakai, Makoto Sekine, Yukimasa Yoshida, Koichiro Inazawa, Masahiro Ogasawara +2 more | 1998-02-10 |
| 5707487 | Method of manufacturing semiconductor device | Masaru Hori, Hiroyuki Yano, Haruo Okano | 1998-01-13 |
| 5707501 | Filter manufacturing apparatus | Soichi Inoue, Tadahito Fujisawa, Shin Ito, Takashi Sato, Shuichi Tamamushi | 1998-01-13 |
| 5698070 | Method of etching film formed on semiconductor wafer | Yoshihisa Hirano, Yoshifumi Tahara, Hiroshi Nishikawa, Isahiro Hasegawa | 1997-12-16 |
| 5660671 | Magnetron plasma processing apparatus and processing method | Hiromi Harada, Sinji Kubota, Hiromi Kumagai, Junichi Arami, Isahiro Hasegawa +3 more | 1997-08-26 |
| 5660744 | Plasma generating apparatus and surface processing apparatus | Makoto Sekine, Haruo Okano, Katsuya Okumura, Isahiro Hasegawa, Masaki Narita | 1997-08-26 |
| 5639699 | Focused ion beam deposition using TMCTS | Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, Mitsuyo Kariya, Soichi Inoue +7 more | 1997-06-17 |