YH

Yasuhiro Horiike

KT Kabushiki Kaisha Toshiba: 9 patents #3,402 of 21,451Top 20%
UN Unknown: 6 patents #2,010 of 83,584Top 3%
TL Tokyo Electron Limited: 6 patents #1,241 of 5,567Top 25%
TO Toshiba: 5 patents #173 of 2,688Top 7%
SC Speedfam Co.: 4 patents #10 of 105Top 10%
NS National Institute For Materials Science: 3 patents #129 of 901Top 15%
Rohm Co.: 2 patents #1,039 of 2,292Top 50%
SP Speedfam-Ipec: 2 patents #50 of 143Top 35%
TE Tokyo Shibaura Electric: 2 patents #32 of 337Top 10%
Bridgestone: 1 patents #1,586 of 2,860Top 60%
JA Japan Science And Technology Agency: 1 patents #756 of 2,171Top 35%
TL Tokyo Electron Yamanashi Limited: 1 patents #52 of 138Top 40%
CC Citizen Watch Co.: 1 patents #668 of 1,225Top 55%
Applied Materials: 1 patents #4,780 of 7,310Top 70%
RJ Research Development Corporation Of Japan: 1 patents #170 of 402Top 45%
Overall (All Time): #83,444 of 4,157,543Top 3%
39
Patents All Time

Issued Patents All Time

Showing 1–25 of 39 patents

Patent #TitleCo-InventorsDate
7972577 Chip using method and test chip Akinori Yokogawa 2011-07-05
7691328 Chip using method and test chip Akinori Yokogawa 2010-04-06
7691369 Cultured cell construct which contains spheroids of cultured animal cells and the use thereof Kazunori Kataoka, Hidenori Otsuka, Teruo Okano, Yukio Nagasaki 2010-04-06
7678577 Blood analysis apparatus and blood analysis method Akio Oki 2010-03-16
7582259 Blood analysis device and blood analysis method Hiroki Ogawa 2009-09-01
7470424 Cultured cell construct containing spheroids of cultured animal cells and utilization thereof Kazunori Kataoka, Hidenori Otsuka, Teruo Okano, Yukio Nagasaki 2008-12-30
6496748 Wafer flattening process and storage medium Michihiko Yanagisawa, Shinya Iida 2002-12-17
6461533 Etchant for silicon oxide and method Yoshio Ishikawa, Keiji Horioka 2002-10-08
6451217 Wafer etching method Michihiko Yanagisawa, Chikai Tanaka, Shinya Iida 2002-09-17
6360687 Wafer flattening system Michihiko Yanagisawa, Takeshi Sadohara, Chikai Tanaka, Shinya Iida 2002-03-26
6316369 Corrosion-resistant system and method for a plasma etching apparatus Michihiko Yanagisawa, Shinya Iida 2001-11-13
6280645 Wafer flattening process and system Michihiko Yanagisawa, Shinya Iida 2001-08-28
6254718 Combined CMP and plasma etching wafer flattening system Chikai Tanaka, Michihiko Yanagisawa, Shinya Iida 2001-07-03
6159388 Plasma etching method and plasma etching system for carrying out the same Michihiko Yanagisawa, Shinya Iida 2000-12-12
6155200 ECR plasma generator and an ECR system using the generator Kohei Kawamura 2000-12-05
6096176 Sputtering method and a sputtering apparatus thereof Takayuki Fukasawa 2000-08-01
5997700 Method of fabricating magnetic head slider Nobuto Fukushima 1999-12-07
5855728 Method for cleaning vulcanization mold Shinji Saitoh, Shingo Ohno, Nobuko Kato, Kazuo Naito 1999-01-05
5851600 Plasma process method and apparatus Yasuo Kobayashi 1998-12-22
5487785 Plasma treatment apparatus Takayuki Fukasawa 1996-01-30
5308791 Method and apparatus for processing surface of semiconductor layer Kohei Kawamura 1994-05-03
5290609 Method of forming dielectric film for semiconductor devices Kohei Kawamura 1994-03-01
5185132 Atomspheric plasma reaction method and apparatus therefor Satiko Okazaki, Masuhiro Kogoma 1993-02-09
5112645 Phototreating method and apparatus therefor Makoto Sekine, Haruo Okano 1992-05-12
4878995 Method of dry etching and apparatus for use in such method Tsunetoshi Arikado, Makoto Sekine, Haruo Okano 1989-11-07