Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11504669 | Method for exhaust gas abatement under reduced pressure and apparatus therefor | Tsutomu Tsukada, Hiroshi Imamura | 2022-11-22 |
| 10617997 | Apparatus for exhaust gas abatement under reduced pressure | Masashi Maeda, Akihisa Yoshida, Tsutomu Tsukada, Hiroshi Imamura | 2020-04-14 |
| 7094355 | Local dry etching method | Tadayoshi Okuya | 2006-08-22 |
| 7005032 | Wafer table for local dry etching apparatus | Kazuyuki Tsuruoka, Chikai Tanaka | 2006-02-28 |
| 6908566 | Local dry etching method | Kazuyuki Tsuruoka | 2005-06-21 |
| 6875701 | Nanotopography removing method | Tadayoshi Okuya | 2005-04-05 |
| 6649528 | Local dry etching method | Tadayoshi Okuya | 2003-11-18 |
| 6496748 | Wafer flattening process and storage medium | Shinya Iida, Yasuhiro Horiike | 2002-12-17 |
| 6451217 | Wafer etching method | Chikai Tanaka, Shinya Iida, Yasuhiro Horiike | 2002-09-17 |
| 6432824 | Method for manufacturing a semiconductor wafer | — | 2002-08-13 |
| 6429399 | Discharge tube for a local etching apparatus and a local etching apparatus using the discharge tube | Tadayoshi Okuya | 2002-08-06 |
| 6406589 | Processing apparatus for etching the edge of a silicon wafer | — | 2002-06-18 |
| 6360687 | Wafer flattening system | Takeshi Sadohara, Chikai Tanaka, Shinya Iida, Yasuhiro Horiike | 2002-03-26 |
| 6316369 | Corrosion-resistant system and method for a plasma etching apparatus | Shinya Iida, Yasuhiro Horiike | 2001-11-13 |
| 6306245 | Plasma etching apparatus | Shinya Iida | 2001-10-23 |
| 6303511 | Wafer flattening process | Takeshi Sadohara | 2001-10-16 |
| 6302995 | Local etching apparatus | Chikai Tanaka | 2001-10-16 |
| 6280645 | Wafer flattening process and system | Shinya Iida, Yasuhiro Horiike | 2001-08-28 |
| 6254718 | Combined CMP and plasma etching wafer flattening system | Chikai Tanaka, Shinya Iida, Yasuhiro Horiike | 2001-07-03 |
| 6159388 | Plasma etching method and plasma etching system for carrying out the same | Shinya Iida, Yasuhiro Horiike | 2000-12-12 |
| 5980769 | Plasma etching method | Shinya Iida | 1999-11-09 |