| 6496748 |
Wafer flattening process and storage medium |
Michihiko Yanagisawa, Yasuhiro Horiike |
2002-12-17 |
| 6451217 |
Wafer etching method |
Michihiko Yanagisawa, Chikai Tanaka, Yasuhiro Horiike |
2002-09-17 |
| 6360687 |
Wafer flattening system |
Michihiko Yanagisawa, Takeshi Sadohara, Chikai Tanaka, Yasuhiro Horiike |
2002-03-26 |
| 6316369 |
Corrosion-resistant system and method for a plasma etching apparatus |
Michihiko Yanagisawa, Yasuhiro Horiike |
2001-11-13 |
| 6306245 |
Plasma etching apparatus |
Michihiko Yanagisawa |
2001-10-23 |
| 6280645 |
Wafer flattening process and system |
Michihiko Yanagisawa, Yasuhiro Horiike |
2001-08-28 |
| 6254718 |
Combined CMP and plasma etching wafer flattening system |
Chikai Tanaka, Michihiko Yanagisawa, Yasuhiro Horiike |
2001-07-03 |
| 6159388 |
Plasma etching method and plasma etching system for carrying out the same |
Michihiko Yanagisawa, Yasuhiro Horiike |
2000-12-12 |
| 6159082 |
Slurry circulation type surface polishing machine |
Misuo Sugiyama, Xu-Jin Wang |
2000-12-12 |
| 6126531 |
Slurry recycling system of CMP apparatus and method of same |
Akitoshi Yoshida |
2000-10-03 |
| 6106728 |
Slurry recycling system and method for CMP apparatus |
Akitoshi Yoshida |
2000-08-22 |
| 5980769 |
Plasma etching method |
Michihiko Yanagisawa |
1999-11-09 |
| 4745088 |
Vapor phase growth on semiconductor wafers |
Yosuke Inoue, Takaya Suzuki, Masahiro Okamura, Noboru Akiyama, Masato Fujita +1 more |
1988-05-17 |
| 4581101 |
Dry-etching process |
Makoto Senoue, Kunihiko Terase, Hideo Komatsu |
1986-04-08 |
| 4427515 |
Surface acoustic wave device and method for manufacturing the same |
Akitsuna Yuhara, Hideo Abe, Kiyoharu Kishimoto, Katashi Hazama |
1984-01-24 |
| 4412119 |
Method for dry-etching |
Hideo Komatsu, Tatsumi Mizutani, Kazuyoshi Ueki |
1983-10-25 |
| 4352974 |
Plasma etcher having isotropic subchamber with gas outlet for producing uniform etching |
Tatsumi Mizutani, Norio Kanai, Kunio Harada, Hideo Komatsu |
1982-10-05 |
| 4308089 |
Method for preventing corrosion of Al and Al alloys |
Kazuyoshi Ueki, Tatsumi Mizutani, Hideo Komatsu, Kado Hirobe |
1981-12-29 |
| 4289188 |
Method and apparatus for monitoring etching |
Tatsumi Mizutani, Kazuyoshi Ueki, Hideo Komatsu |
1981-09-15 |
| 4267013 |
Method for dry-etching aluminum and aluminum alloys |
Kazuyoshi Ueki, Hideo Komatsu, Tatsumi Mitzutani |
1981-05-12 |