Issued Patents All Time
Showing 1–25 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12102151 | Fiber for artificial hair and hair ornament product including same | Mika Yorizane, Hiroshi Fujinaga, Tomomichi Hashimoto | 2024-10-01 |
| 11515167 | Plasma etching method and plasma processing apparatus | Sumiko Fujisaki, Yoshihide Yamaguchi, Hiroyuki Kobayashi, Kazunori Shinoda, Yutaka Kouzuma +1 more | 2022-11-29 |
| 11217454 | Plasma processing method and etching apparatus | Kazunori Shinoda, Hiroto Otake, Hiroyuki Kobayashi, Masaru Izawa | 2022-01-04 |
| 10872779 | Plasma etching method and plasma etching apparatus | Nobuya Miyoshi, Hiroyuki Kobayashi, Kazunori Shinoda, Kazumasa Ookuma, Yutaka Kouzuma +1 more | 2020-12-22 |
| D901407 | Integrated type ion shield for semiconductor manufacturing apparatus | Yutaka Kouzuma, Michiaki Kobayashi, Kazuyuki Hirozane, Nobuya Miyoshi, Hiroyuki Kobayashi | 2020-11-10 |
| D900760 | Ion shield plate for semiconductor manufacturing apparatus | Yutaka Kouzuma, Michiaki Kobayashi, Kazuyuki Hirozane, Nobuya Miyoshi, Hiroyuki Kobayashi | 2020-11-03 |
| 10418254 | Etching method and etching apparatus | Kazunori Shinoda, Naoyuki Kofuji, Hiroyuki Kobayashi, Nobuya Miyoshi, Masaru Izawa +2 more | 2019-09-17 |
| 10388557 | Placing bed structure, treating apparatus using the structure, and method for using the apparatus | Yasuo Kobayashi, Toshihisa Nozawa, Kiyotaka Ishibashi | 2019-08-20 |
| 9640388 | Method for forming insulating film and method for manufacturing semiconductor device | Shigeru Kasai, Kotaro Miyatani, Takuya Kurotori, Kenichi KOTE, Yutaka Fujino +1 more | 2017-05-02 |
| 9560891 | Polyester-based fiber for artificial hair and hair ornament product including the same, and method for producing the same | Tomokazu Higami, Tomomichi Hashimoto, Mika Yorizane | 2017-02-07 |
| 9315922 | Polyester-based fiber for artificial hair and hair ornament product including the same | Tomomichi Hashimoto, Tomokazu Higami, Mika Yorizane | 2016-04-19 |
| 9177846 | Placing bed structure, treating apparatus using the structure, and method for using the apparatus | Yasuo Kobayashi, Toshihisa Nozawa, Kiyotaka Ishibashi | 2015-11-03 |
| 8711265 | Image processing apparatus, control method for the same, and storage medium | Toshiyuki Noguchi | 2014-04-29 |
| 8435882 | Film forming method for a semiconductor | Takaaki Matsuoka | 2013-05-07 |
| 8394231 | Plasma process device and plasma process method | Koichi Takatsuki, Hikaru Yoshitaka, Shigeo Ashigaki, Yoichi Inoue, Takashi Akahori +7 more | 2013-03-12 |
| 8197913 | Film forming method for a semiconductor | Takaaki Matsuoka | 2012-06-12 |
| 8124523 | Fabrication method of a semiconductor device and a semiconductor device | Toshihisa Nozawa, Takaaki Matsuoka | 2012-02-28 |
| 8021975 | Plasma processing method for forming a film and an electronic component manufactured by the method | Kotaro Miyatani, Toshihisa Nozawa, Takaaki Matsuoka | 2011-09-20 |
| 8017197 | Plasma processing method and plasma processing apparatus | Yasuo Kobayashi | 2011-09-13 |
| 7923819 | Interlayer insulating film, wiring structure and electronic device and methods of manufacturing the same | Tadahiro Ohmi, Seiji Yasuda, Atsutoshi Inokuchi, Takaaki Matsuoka | 2011-04-12 |
| 7897205 | Film forming method and film forming apparatus | Takatoshi Kameshima, Yasuo Kobayashi | 2011-03-01 |
| 7776736 | Substrate for electronic device capable of suppressing fluorine atoms exposed at the surface of insulating film from reacting with water and method for processing same | Yasuo Kobayashi | 2010-08-17 |
| 7765466 | Information processing apparatus that stores a plurality of image data items having different data-formats and communicates with an external apparatus via a network, and method therefor | — | 2010-07-27 |
| 7717061 | Gas switching mechanism for plasma processing apparatus | Tadahiro Ishizaka, Naoki Yoshii, Yukio Fukuda, Takashi Shigeoka, Yasuhiko Kojima +3 more | 2010-05-18 |
| 7704893 | Semiconductor device, method for manufacturing semiconductor device and gas for plasma CVD | Yasuo Kobayashi, Tadahiro Ohmi, Akinobu Teramoto, Tatsuya Sugimoto, Toshiro Yamada +1 more | 2010-04-27 |