Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12129544 | Cleaning method and plasma treatment device | Yoshiyuki Kondo, Hiroyuki Ikuta, Hideki Yuasa | 2024-10-29 |
| 12112921 | Plasma processing method and plasma processing apparatus | Hiroyuki Ikuta, Hirokazu Ueda | 2024-10-08 |
| 12077865 | Film forming method and film forming apparatus | Hideki Yuasa, Hiroyuki Ikuta, Makoto Wada, Hirokazu Ueda | 2024-09-03 |
| 12060641 | Film forming method and film forming apparatus | Hirokazu Ueda, Hideki Yuasa, Yoshiyuki Kondo, Hiroyuki Ikuta | 2024-08-13 |
| 10879069 | Method and apparatus for forming hard mask film and method for manufacturing semiconductor devices | — | 2020-12-29 |
| 10804078 | Plasma processing apparatus and gas introduction mechanism | Tomohito Komatsu, Taro Ikeda, Jun NAKAGOMI, Takeo Wakutsu | 2020-10-13 |
| 10557200 | Plasma processing device with shower plate having protrusion for suppressing film formation in gas holes of shower plate | Taro Ikeda, Shigeru Kasai, Emiko HARA, Yuki Osada, Jun NAKAGOMI +1 more | 2020-02-11 |
| 10211032 | Microwave plasma source and plasma processing apparatus | Tomohito Komatsu, Taro Ikeda | 2019-02-19 |
| 10170347 | Substrate processing system | — | 2019-01-01 |
| 10153169 | Method of controlling threshold of transistor and method of manufacturing semiconductor device | Kentaro Shiraga, Koji Akiyama, Junya Miyahara | 2018-12-11 |
| 9991097 | Plasma processing apparatus | Tomohito Komatsu, Shigenori Ozaki, Jun NAKAGOMI | 2018-06-05 |
| 9887081 | Method for manufacturing insulating film laminated structure | Junya Miyahara, Genji Nakamura, Kentaro Shiraga | 2018-02-06 |
| 9702913 | Acquisition method for S-parameters in microwave introduction modules, and malfunction detection method | Taro Ikeda, Hikaru Adachi, Hiroyuki Miyashita, Yuki Osada, Nobuhiko Yamamoto | 2017-07-11 |
| 9663856 | Plasma processing apparatus and shower plate | Shigeru Kasai, Taro Ikeda | 2017-05-30 |
| 9640388 | Method for forming insulating film and method for manufacturing semiconductor device | Shigeru Kasai, Kotaro Miyatani, Takuya Kurotori, Kenichi KOTE, Akira Tanihara +1 more | 2017-05-02 |
| 9548187 | Microwave radiation antenna, microwave plasma source and plasma processing apparatus | Taro Ikeda, Tomohito Komatsu, Shigeru Kasai, Hiroyuki Miyashita, Yuki Osada +1 more | 2017-01-17 |
| 9520272 | Microwave emission mechanism, microwave plasma source and surface wave plasma processing apparatus | Taro Ikeda, Hiroyuki Miyashita, Yuki Osada, Tomohito Komatsu | 2016-12-13 |
| 8961735 | Plasma processing apparatus and microwave introduction device | Atsushi Ueda, Shigenori Ozaki, Junichi Kitagawa | 2015-02-24 |
| 7915177 | Method of forming gate insulation film, semiconductor device, and computer recording medium | Tatsuo Nishita, Shuuichi Ishizuka, Toshio Nakanishi, Yoshihiro Sato | 2011-03-29 |
| 7674722 | Method of forming gate insulating film, semiconductor device and computer recording medium | Tatsuo Nishita, Shuuichi Ishizuka, Toshio Nakanishi, Yoshihiro Sato | 2010-03-09 |
| 6047682 | Accumulating type fuel injection control | Akihiko Sekiguchi | 2000-04-11 |