Issued Patents All Time
Showing 1–25 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11646197 | Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition | Timothee Blanquart, Mitsuya Utsuno, Yoshio Susa, Atsuki Fukazawa | 2023-05-09 |
| 11415087 | EGR device | Tetsuya Kosaka, Kazumichi Matsuishi, Naoya Junicho, Kensuke Fujita | 2022-08-16 |
| 10968513 | Plasma film-forming apparatus and substrate pedestal | Masashi Imanaka, Minoru Honda, Koji Kotani | 2021-04-06 |
| 10755922 | Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition | Timothee Blanquart, Mitsuya Utsuno, Yoshio Susa, Atsuki Fukazawa | 2020-08-25 |
| 10318441 | Modular measurement apparatus | Yoshinori Inoue, Katsunori Yazawa, Hiroshi Inagaki, Wenjing Ma, Kaoru Hisada | 2019-06-11 |
| 10190217 | Plasma film-forming method and plasma film-forming apparatus | Minoru Honda, Masashi Imanaka, Cheonsoo Han | 2019-01-29 |
| 10094757 | Particulate measurement apparatus and particulate measurement system | Kaoru Hisada, Yuichi Goto, Katsunori Yazawa | 2018-10-09 |
| 10017853 | Processing method of silicon nitride film and forming method of silicon nitride film | Daisuke Katayama | 2018-07-10 |
| 9779936 | Plasma processing method and plasma processing apparatus | Daisuke Katayama, Minoru Honda | 2017-10-03 |
| 9670883 | Engine | Kazumichi Matsuishi, Tetsuya Kosaka, Tomohiro Ninomiya, Yusuke Suzuki, Yongchol Lee +1 more | 2017-06-06 |
| D721097 | Internal combustion engine | Tetsuya Kosaka | 2015-01-13 |
| 8569186 | Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device | Masayuki Kohno, Tatsuo Nishita | 2013-10-29 |
| 8366953 | Plasma cleaning method and plasma CVD method | Masayuki Kohno, Tatsuo Nishita | 2013-02-05 |
| 8329596 | Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device | Masayuki Kohno, Tatsuo Nishita | 2012-12-11 |
| 8318614 | Method for forming silicon nitride film, method for manufacturing nonvolatile semiconductor memory device, nonvolatile semiconductor memory device and plasma apparatus | Masayuki Kohno, Tatsuo Nishita, Yoshihiro Hirota | 2012-11-27 |
| 8258571 | MOS semiconductor memory device having charge storage region formed from stack of insulating films | Tetsuo Endoh, Masayuki Kohno, Tatsuo Nishita, Minoru Honda, Yoshihiro Hirota | 2012-09-04 |
| 8247331 | Method for forming insulating film and method for manufacturing semiconductor device | Minoru Honda, Yoshihiro Sato | 2012-08-21 |
| 8183165 | Plasma processing method | Seiji Matsuyama, Shigenori Ozaki, Hikaru Adachi, Koichi Takatsuki, Yoshihiro Sato | 2012-05-22 |
| 8158535 | Method for forming insulating film and method for manufacturing semiconductor device | Minoru Honda, Yoshihiro Sato | 2012-04-17 |
| 8138103 | Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device | Masayuki Kohno, Tatsuo Nishita | 2012-03-20 |
| 8124484 | Forming a MOS memory device having a dielectric film laminate as a charge accumulation region | Tetsuo Endoh, Masayuki Kohno, Syuichiro Otao, Minoru Honda | 2012-02-28 |
| 8119545 | Forming a silicon nitride film by plasma CVD | Minoru Honda, Masayuki Kohno, Tatsuo Nishita, Junya Miyahara | 2012-02-21 |
| 8114790 | Plasma CVD method, silicon nitride film formation method, semiconductor device manufacturing method, and plasma CVD apparatus | Masayuki Kohno, Tatsuo Nishita | 2012-02-14 |
| 8021987 | Method of modifying insulating film | Takuya Sugawara, Yoshihide Tada, Genji Nakamura, Shigenori Ozaki, Masaru Sasaki +4 more | 2011-09-20 |
| 7968470 | Plasma nitriding method, method for manufacturing semiconductor device and plasma processing apparatus | Tadahiro Ohmi, Akinobu Teramoto, Minoru Honda | 2011-06-28 |