Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12385131 | Method of forming a structure including a silicon carbide layer | — | 2025-08-12 |
| 12125700 | Method of forming high aspect ratio features | Mitsuya Utsuno, Hirotsugu Sugiura | 2024-10-22 |
| 12040177 | Methods for forming a laminate film by cyclical plasma-enhanced deposition processes | — | 2024-07-16 |
| 11705333 | Structures including multiple carbon layers and methods of forming and using same | Ryo Miyama, Yoshiyuki Kikuchi | 2023-07-18 |
| 11646197 | Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition | Timothee Blanquart, Mitsuya Utsuno, Atsuki Fukazawa, Toshio Nakanishi | 2023-05-09 |
| 11626316 | Method of depositing carbon-containing material on a surface of a substrate, structure formed using the method, and system for forming the structure | Mitsuya Utsuno, Yan Zhang, Atsuki Fukazawa | 2023-04-11 |
| 11430674 | Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods | — | 2022-08-30 |
| 11348766 | Substrate processing apparatus | — | 2022-05-31 |
| 10844484 | Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods | Lucian Jdira, Herbert Terhorst, Naoto Tsuji | 2020-11-24 |
| 10755922 | Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition | Timothee Blanquart, Mitsuya Utsuno, Atsuki Fukazawa, Toshio Nakanishi | 2020-08-25 |
| 10707073 | Film forming method and patterning method | Yuko Kengoyama, Taishi Ebisudani | 2020-07-07 |
| 10629415 | Substrate processing apparatus and method for processing substrate | — | 2020-04-21 |
| 10290508 | Method for forming vertical spacers for spacer-defined patterning | Tomohiro Kubota | 2019-05-14 |
| 9659754 | Plasma processing apparatus and plasma processing method | Jun Yoshikawa, Naoki Matsumoto, Peter Ventzek | 2017-05-23 |