Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12417911 | Method and system for forming silicon nitride layer using low radio frequency plasma process | Makoto Igarashi | 2025-09-16 |
| 12033849 | Method for depositing silicon oxide film having improved quality by PEALD using bis(diethylamino)silane | Hidemi Suemori, Ryu Nakano | 2024-07-09 |
| 11527400 | Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane | Hidemi Suemori, Ryu Nakano | 2022-12-13 |
| 10770257 | Substrate processing method | Takashi Yoshida | 2020-09-08 |
| 10707073 | Film forming method and patterning method | Yoshio Susa, Taishi Ebisudani | 2020-07-07 |