Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12394626 | Method of forming a structure and system for same | Zecheng Liu, Takashi Yoshida, Ivan Zyulkov, Yiting Sun, Yoann Tomczak +1 more | 2025-08-19 |
| 12074022 | Method and system for forming patterned structures using multiple patterning process | Naoki Inoue, Shinya Yamada, Mao Tsuchiya | 2024-08-27 |
| 12033849 | Method for depositing silicon oxide film having improved quality by PEALD using bis(diethylamino)silane | Yuko Kengoyama, Hidemi Suemori | 2024-07-09 |
| 11970769 | Cyclical deposition methods | Trigagema Gama | 2024-04-30 |
| 11830738 | Method for forming barrier layer and method for manufacturing semiconductor device | — | 2023-11-28 |
| 11527400 | Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane | Yuko Kengoyama, Hidemi Suemori | 2022-12-13 |
| 11482418 | Substrate processing method and apparatus | Akinori Nakano, Toshihisa Nozawa | 2022-10-25 |
| 11302527 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2022-04-12 |
| 10784105 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2020-09-22 |
| 10510530 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2019-12-17 |
| 10147600 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2018-12-04 |
| 10043661 | Method for protecting layer by forming hydrocarbon-based extremely thin film | Richika Kato | 2018-08-07 |
| 9875893 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2018-01-23 |
| 9673092 | Film forming apparatus, and method of manufacturing semiconductor device | Noboru Takamure, Hiroki Arai | 2017-06-06 |
| 9663857 | Method for stabilizing reaction chamber pressure | Wataru Adachi | 2017-05-30 |
| 9564314 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2017-02-07 |
| 9464352 | Low-oxidation plasma-assisted process | Naoki Inoue, Kunitoshi Namba | 2016-10-11 |
| 9368352 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2016-06-14 |
| 9343308 | Method for trimming carbon-containing film at reduced trimming rate | Yoshihiro Isii, Naoki Inoue | 2016-05-17 |
| 9284642 | Method for forming oxide film by plasma-assisted processing | Naoki Inoue | 2016-03-15 |
| 9153441 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2015-10-06 |
| 9123510 | Method for controlling in-plane uniformity of substrate processed by plasma-assisted process | Naoki Inoue | 2015-09-01 |
| 8742668 | Method for stabilizing plasma ignition | Tsutomu Makino, Hisashi Takamizawa | 2014-06-03 |
| 8679958 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2014-03-25 |
| 8298951 | Footing reduction using etch-selective layer | — | 2012-10-30 |