Issued Patents All Time
Showing 1–25 of 70 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12410516 | Container for efficient vaporization of precursor materials and method of using the same | — | 2025-09-09 |
| 12154785 | Deposition of oxide thin films | Suvi Haukka, Elina Färm, Raija H. Matero, Eva Tois, Hidemi Suemori +2 more | 2024-11-26 |
| 12080548 | Selective deposition using hydrophobic precursors | Elina Färm, Hidemi Suemori, Raija H. Matero, Suvi Haukka, Eva Tois | 2024-09-03 |
| 12024772 | Apparatuses for thin film deposition | Jun Kawahara, Suvi Haukka, Eva Tois, Raija H. Matero, Hidemi Suemori +2 more | 2024-07-02 |
| 11975357 | Selective deposition of metals, metal oxides, and dielectrics | Suvi Haukka, Raija H. Matero, Eva Tois, Marko Tuominen, Hannu Huotari +2 more | 2024-05-07 |
| 11885020 | Transition metal deposition method | Charles Dezelah, Jan Willem Maes, Elina Färm, Saima Ali | 2024-01-30 |
| 11649546 | Organic reactants for atomic layer deposition | Eva Tois, Hidemi Suemori, Suvi Haukka | 2023-05-16 |
| 11646194 | Methods for forming silicon nitride thin films | Suvi Haukka, Jaakko Anttila | 2023-05-09 |
| 11587783 | Si precursors for deposition of SiN at low temperatures | Shang Chen, Viljami Pore, Atsuki Fukazawa, Hideaki Fukuda, Suvi Haukka | 2023-02-21 |
| 11525184 | Dual selective deposition | Suvi Haukka, Raija H. Matero, Eva Tois, Marko Tuominen, Hannu Huotari +1 more | 2022-12-13 |
| 11430656 | Deposition of oxide thin films | Suvi Haukka, Elina Färm, Raija H. Matero, Eva Tois, Hidemi Suemori +2 more | 2022-08-30 |
| 11421321 | Apparatuses for thin film deposition | Jun Kawahara, Suvi Haukka, Eva Tois, Raija H. Matero, Hidemi Suemori +2 more | 2022-08-23 |
| 11367613 | Deposition of SiN | Shang Chen, Viljami Pore, Ryoko Yamada | 2022-06-21 |
| 11302527 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Suvi Haukka, Ryu Nakano +1 more | 2022-04-12 |
| 11289327 | Si precursors for deposition of SiN at low temperatures | Shang Chen, Viljami Pore | 2022-03-29 |
| 11286562 | Gas-phase chemical reactor and method of using same | — | 2022-03-29 |
| 11213853 | Selective deposition of metals, metal oxides, and dielectrics | Suvi Haukka, Raija H. Matero, Eva Tois, Marko Tuominen, Hannu Huotari +2 more | 2022-01-04 |
| 11103162 | Method, apparatus and computer program product for activity recognition | Joachim Wabnig | 2021-08-31 |
| 11081342 | Selective deposition using hydrophobic precursors | Elina Färm, Hidemi Suemori, Raija H. Matero, Suvi Haukka, Eva Tois | 2021-08-03 |
| 11069522 | Si precursors for deposition of SiN at low temperatures | Shang Chen, Viljami Pore, Atsuki Fukazawa, Hideaki Fukuda, Suvi Haukka | 2021-07-20 |
| 11062914 | Removal of surface passivation | Jaakko Anttila | 2021-07-13 |
| 11056385 | Selective formation of metallic films on metallic surfaces | Suvi Haukka, Marko Tuominen | 2021-07-06 |
| 11047040 | Dual selective deposition | Suvi Haukka, Raija H. Matero, Eva Tois, Marko Tuominen, Hannu Huotari +1 more | 2021-06-29 |
| 10793946 | Reaction chamber passivation and selective deposition of metallic films | Delphine Longrie, Han Wang, Qi Xie, Jan Willem Maes, Shang Chen +4 more | 2020-10-06 |
| 10784105 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Suvi Haukka, Ryu Nakano +1 more | 2020-09-22 |