Issued Patents All Time
Showing 1–25 of 173 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12320012 | Thermal atomic layer etching processes | Tom E. Blomberg, Varun Sharma, Marko Tuominen, Chiyu Zhu | 2025-06-03 |
| 12322593 | Selective passivation and selective deposition | Jan Willem Maes, Michael Eugene Givens, Vamsi K. Paruchuri, Ivo Raaijmakers, Shaoren Deng +4 more | 2025-06-03 |
| 12312696 | Thermal atomic layer etching processes | Tom E. Blomberg, Varun Sharma, Marko Tuominen, Chiyu Zhu | 2025-05-27 |
| 12300505 | Deposition of organic films | Eva Tois, Hidemi Suemori, Viljami Pore, Varun Sharma, Jan Willem Maes +2 more | 2025-05-13 |
| 12240760 | Aligned carbon nanotubes | — | 2025-03-04 |
| 12237392 | Titanium aluminum and tantalum aluminum thin films | Michael Eugene Givens, Eric James Shero, Jerry Winkler, Petri Raisanen, Timo Asikainen +2 more | 2025-02-25 |
| 12205820 | Deposition of organic films | Eva Tois, Hidemi Suemori, Viljami Pore, Varun Sharma | 2025-01-21 |
| 12170197 | Selective passivation and selective deposition | Eva Tois, Raija H. Matero, Elina Färm, Delphine Longrie, Hidemi Suemori +5 more | 2024-12-17 |
| 12154785 | Deposition of oxide thin films | Elina Färm, Raija H. Matero, Eva Tois, Hidemi Suemori, Antti Niskanen +2 more | 2024-11-26 |
| 12094686 | Atomic layer etching processes | Tom E. Blomberg, Varun Sharma, Marko Tuominen, Chiyu Zhu | 2024-09-17 |
| 12080548 | Selective deposition using hydrophobic precursors | Elina Färm, Hidemi Suemori, Raija H. Matero, Antti Niskanen, Eva Tois | 2024-09-03 |
| 12024772 | Apparatuses for thin film deposition | Jun Kawahara, Antti Niskanen, Eva Tois, Raija H. Matero, Hidemi Suemori +2 more | 2024-07-02 |
| 11975357 | Selective deposition of metals, metal oxides, and dielectrics | Raija H. Matero, Eva Tois, Antti Niskanen, Marko Tuominen, Hannu Huotari +2 more | 2024-05-07 |
| 11967488 | Method for treatment of deposition reactor | Eric James Shero, Fred Alokozai, Dong Li, Jereld Lee Winkler, Xichong Chen | 2024-04-23 |
| 11830732 | Selective passivation and selective deposition | Jan Willem Maes, Michael Eugene Givens, Vamsi K. Paruchuri, Ivo Raaijmakers, Shaoren Deng +4 more | 2023-11-28 |
| 11739427 | Thermal atomic layer etching processes | Tom E. Blomberg, Varun Sharma, Marko Tuominen, Chiyu Zhu | 2023-08-29 |
| 11739428 | Thermal atomic layer etching processes | Tom E. Blomberg, Varun Sharma, Marko Tuominen, Chiyu Zhu | 2023-08-29 |
| 11728175 | Deposition of organic films | Eva Tois, Hidemi Suemori, Viljami Pore, Varun Sharma, Jan Willem Maes +2 more | 2023-08-15 |
| 11728164 | Selective PEALD of oxide on dielectric | Eva Tois, Viljami Pore, Toshiya Suzuki, Lingyun Jia, Sun Ja Kim +1 more | 2023-08-15 |
| 11649546 | Organic reactants for atomic layer deposition | Antti Niskanen, Eva Tois, Hidemi Suemori | 2023-05-16 |
| 11646194 | Methods for forming silicon nitride thin films | Antti Niskanen, Jaakko Anttila | 2023-05-09 |
| 11640899 | Atomic layer etching processes | Tom E. Blomberg, Varun Sharma, Marko Tuominen, Chiyu Zhu | 2023-05-02 |
| 11610775 | Method and apparatus for filling a gap | Viljami Pore, Werner Knaepen, Bert Jongbloed, Dieter Pierreux, Steven R. A. Van Aerde +2 more | 2023-03-21 |
| 11608557 | Simultaneous selective deposition of two different materials on two different surfaces | Michael Eugene Givens, Eva Tois, Daria Nevstrueva, Charles Dezelah | 2023-03-21 |
| 11587783 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Viljami Pore, Atsuki Fukazawa, Hideaki Fukuda | 2023-02-21 |