Issued Patents All Time
Showing 1–25 of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12362115 | Vacuum interrupter | Noboru Sakurai, Hiroki Narita | 2025-07-15 |
| 12210781 | Storage device and protocol conversion method by storage device | Katsuya Tanaka, Yutaro Kobayashi | 2025-01-28 |
| 12129546 | Methods and apparatuses for flowable gap-fill | Shinya Yoshimoto, Takahiro Onuma, Makoto Igarashi, Yukihiro Mori, René Henricus Jozef Vervuurt +1 more | 2024-10-29 |
| 12045507 | Storage system, data write control method, and non-transitory computer readable medium for storing data write control program | Yutaro Kobayashi, Katsuya Tanaka, Yoshikazu Murayama | 2024-07-23 |
| 11996286 | Silicon precursors for silicon nitride deposition | Charles Dezelah, Viljami Pore | 2024-05-28 |
| 11804346 | Vacuum interrupter and vacuum breaker | — | 2023-10-31 |
| 11610775 | Method and apparatus for filling a gap | Viljami Pore, Werner Knaepen, Bert Jongbloed, Dieter Pierreux, Steven R. A. Van Aerde +2 more | 2023-03-21 |
| 11587783 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Viljami Pore, Atsuki Fukazawa, Suvi Haukka | 2023-02-21 |
| 11453943 | Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor | Atsuki Fukazawa | 2022-09-27 |
| 11302527 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Antti Niskanen, Suvi Haukka, Ryu Nakano +1 more | 2022-04-12 |
| 11069522 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Viljami Pore, Atsuki Fukazawa, Suvi Haukka | 2021-07-20 |
| 10854498 | Wafer-supporting device and method for producing same | Fumitaka Shoji | 2020-12-01 |
| 10784105 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Antti Niskanen, Suvi Haukka, Ryu Nakano +1 more | 2020-09-22 |
| 10766069 | Method for manufacturing electrode material | Shota Hayashi, Keita Ishikawa, Kenta Yamamura, Kosuke Hasegawa, Akira Sano | 2020-09-08 |
| 10733118 | Computer system, communication device, and storage control method with DMA transfer of data | Sho Takizawa, Kyohei Ide | 2020-08-04 |
| 10655221 | Method for depositing oxide film by thermal ALD and PEALD | Atsuki Fukazawa | 2020-05-19 |
| 10614969 | Method for manufacturing electrode material and electrode material | Keita Ishikawa, Shota Hayashi, Kosuke Hasegawa, Kenta Yamamura | 2020-04-07 |
| 10510530 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Antti Niskanen, Suvi Haukka, Ryu Nakano +1 more | 2019-12-17 |
| 10435790 | Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap | Atsuki Fukazawa, Masaru Zaitsu, Masaki Tokunaga | 2019-10-08 |
| 10395917 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Viljami Pore, Atsuki Fukazawa, Suvi Haukka | 2019-08-27 |
| 10147600 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Antti Niskanen, Suvi Haukka, Ryu Nakano +1 more | 2018-12-04 |
| 9905416 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Viljami Pore, Atsuki Fukazawa, Suvi Haukka | 2018-02-27 |
| 9875893 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Antti Niskanen, Suvi Haukka, Ryu Nakano +1 more | 2018-01-23 |
| 9812320 | Method and apparatus for filling a gap | Viljami Pore, Werner Knaepen, Bert Jongbloed, Dieter Pierreux, Steven R. A. Van Aerde +2 more | 2017-11-07 |
| 9812319 | Method for forming film filled in trench without seam or void | Atsuki Fukazawa | 2017-11-07 |