RV

René Henricus Jozef Vervuurt

AB Asm Ip Holding B.V.: 15 patents #57 of 620Top 10%
Overall (All Time): #304,768 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Showing 1–15 of 15 patents

Patent #TitleCo-InventorsDate
12424490 Halogenation-based gapfill method and system Timothee Blanquart, Jihee Jeon 2025-09-23
12406881 Methods and systems for filling a gap Elina Färm, Shinya Iwashita, Charles Dezelah, Jan Willem Maes, Timothee Blanquart +5 more 2025-09-02
12347675 Methods and systems for topography-selective depositions Akiko Kobayashi, Nobuyoshi Kobayashi, Takayoshi Tsutsumi, Masaru Hori 2025-07-01
12322575 Etching processes and processing assemblies Bablu Mukherjee, Takayoshi Tsutsumi, Nobuyoshi Kobayashi, Masaru Hori 2025-06-03
12305281 Method for forming metal silicon oxide and metal silicon oxynitride layers Takashi Yoshida 2025-05-20
12266540 Method for fabricating layer structure having target topological profile Eiichiro Shiba, Yoshinori Ota, Nobuyoshi Kobayashi, Akiko Kobayashi 2025-04-01
12211742 Methods for depositing gap filling fluid Timothee Blanquart, Viljami Pore, Jihee Jeon 2025-01-28
12129546 Methods and apparatuses for flowable gap-fill Shinya Yoshimoto, Takahiro Onuma, Makoto Igarashi, Yukihiro Mori, Hideaki Fukuda +1 more 2024-10-29
12104244 Methods and systems for filling a gap Charles Dezelah, Timothee Blanquart, Viljami Pore 2024-10-01
12094769 Methods for filling a gap and related systems and devices Zecheng Liu, Viljami Pore, Jia Yao 2024-09-17
12027365 Methods for filling a gap and related systems and devices Zecheng Liu, Sunja Kim, Viljami Pore, Jia Yao, Ranjit Borude +4 more 2024-07-02
11961741 Method for fabricating layer structure having target topological profile Eiichiro Shiba, Yoshinori Ota, Nobuyoshi Kobayashi, Akiko Kobayashi 2024-04-16
11725280 Method for forming metal silicon oxide and metal silicon oxynitride layers Takashi Yoshida 2023-08-15
10720337 Pre-cleaning for etching of dielectric materials Nobuyoshi Kobayashi, Takayoshi Tsutsumi, Masaru Hori 2020-07-21
10720334 Selective cyclic dry etching process of dielectric materials using plasma modification Nobuyoshi Kobayashi, Takayoshi Tsutsumi, Masaru Hori 2020-07-21