Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12431354 | Silicon nitride and silicon oxide deposition methods using fluorine inhibitor | Takashi Mizoguchi, Shinya Ueda, Sunja Kim | 2025-09-30 |
| 12266540 | Method for fabricating layer structure having target topological profile | Yoshinori Ota, René Henricus Jozef Vervuurt, Nobuyoshi Kobayashi, Akiko Kobayashi | 2025-04-01 |
| 12098460 | Systems and methods for stabilizing reaction chamber pressure | — | 2024-09-24 |
| 12100597 | Method and system for forming patterned structures including silicon nitride | — | 2024-09-24 |
| 11961741 | Method for fabricating layer structure having target topological profile | Yoshinori Ota, René Henricus Jozef Vervuurt, Nobuyoshi Kobayashi, Akiko Kobayashi | 2024-04-16 |
| 11827981 | Method of depositing material on stepped structure | Kentaro Kojima, Takeru Kuwano | 2023-11-28 |
| 11821078 | Method for forming precoat film and method for forming silicon-containing film | Takeru Kuwano, Toshikazu Hamada, Yoshinori Ota | 2023-11-21 |
| 11676812 | Method for forming silicon nitride film selectively on top/bottom portions | Dai Ishikawa, Atsuki Fukazawa, Shinya Ueda, Taishi Ebisudani, SeungJu Chun +4 more | 2023-06-13 |
| 10720322 | Method for forming silicon nitride film selectively on top surface | Dai Ishikawa, Atsuki Fukazawa, Shinya Ueda, Taishi Ebisudani, SeungJu Chun +4 more | 2020-07-21 |
| 10529554 | Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches | Dai Ishikawa, Atsuki Fukazawa, Shinya Ueda, Taishi Ebisudani, SeungJu Chun +4 more | 2020-01-07 |
| 9711345 | Method for forming aluminum nitride-based film by PEALD | — | 2017-07-18 |
| 9447498 | Method for performing uniform processing in gas system-sharing multiple reaction chambers | — | 2016-09-20 |