Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11676812 | Method for forming silicon nitride film selectively on top/bottom portions | Dai Ishikawa, Atsuki Fukazawa, Eiichiro Shiba, Shinya Ueda, Taishi Ebisudani +4 more | 2023-06-13 |
| 11530483 | Substrate processing system | YoonKi Min, Younghoon Kim, Hakjoo Lee | 2022-12-20 |
| 10720322 | Method for forming silicon nitride film selectively on top surface | Dai Ishikawa, Atsuki Fukazawa, Eiichiro Shiba, Shinya Ueda, Taishi Ebisudani +4 more | 2020-07-21 |
| 10529554 | Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches | Dai Ishikawa, Atsuki Fukazawa, Eiichiro Shiba, Shinya Ueda, Taishi Ebisudani +4 more | 2020-01-07 |