Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11637011 | Method of topology-selective film formation of silicon oxide | Atsuki Fukazawa, Pei-Chia Chen | 2023-04-25 |
| 11127589 | Method of topology-selective film formation of silicon oxide | Atsuki Fukazawa | 2021-09-21 |
| 10847365 | Method of forming conformal silicon carbide film by cyclic CVD | Atsuki Fukazawa | 2020-11-24 |
| 10504742 | Method of atomic layer etching using hydrogen plasma | Nobuyoshi Kobayashi, Akiko Kobayashi, Masaru Hori, Takayoshi Tsutsumi | 2019-12-10 |
| 10435790 | Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap | Atsuki Fukazawa, Masaki Tokunaga, Hideaki Fukuda | 2019-10-08 |
| 10283353 | Method of reforming insulating film deposited on substrate with recess pattern | Akiko Kobayashi, Nobuyoshi Kobayashi, Masaru Hori | 2019-05-07 |
| 9818601 | Substrate processing apparatus and method of processing substrate | Masaki Tokunaga, Atsuki Fukazawa | 2017-11-14 |
| 9793135 | Method of cyclic dry etching using etchant film | Nobuyoshi Kobayashi, Akiko Kobayashi, Masaru Hori, Hiroki Kondo, Takayoshi Tsutsumi | 2017-10-17 |
| 9735024 | Method of atomic layer etching using functional group-containing fluorocarbon | — | 2017-08-15 |
| 9627221 | Continuous process incorporating atomic layer etching | Atsuki Fukazawa, Hideaki Fukuda | 2017-04-18 |
| 9455138 | Method for forming dielectric film in trenches by PEALD using H-containing gas | Atsuki Fukazawa, Hideaki Fukuda, Noboru Takamure | 2016-09-27 |
| 5428850 | Shower apparatus | Kazuo Hiraishi, Masanori Sakuragi, Yasuharu Kato | 1995-07-04 |
| 5414879 | Shower apparatus | Kazuo Hiraishi, Masanori Sakuragi, Yasuharu Kato | 1995-05-16 |