Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11784043 | Formation of SiN thin films | Toshiya Suzuki, Viljami Pore, Shang Chen, Ryoko Yamada, Dai Ishikawa | 2023-10-10 |
| 11302527 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2022-04-12 |
| 11133181 | Formation of SiN thin films | Toshiya Suzuki, Viljami Pore, Shang Chen, Ryoko Yamada, Dai Ishikawa | 2021-09-28 |
| 10793946 | Reaction chamber passivation and selective deposition of metallic films | Delphine Longrie, Antti Niskanen, Han Wang, Qi Xie, Jan Willem Maes +4 more | 2020-10-06 |
| 10784105 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2020-09-22 |
| 10510530 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2019-12-17 |
| 10480064 | Reaction chamber passivation and selective deposition of metallic films | Delphine Longrie, Antti Niskanen, Han Wang, Qi Xie, Jan Willem Maes +4 more | 2019-11-19 |
| 10410857 | Formation of SiN thin films | Toshiya Suzuki, Viljami Pore, Shang Chen, Ryoko Yamada, Dai Ishikawa | 2019-09-10 |
| 10147600 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2018-12-04 |
| 10041166 | Reaction chamber passivation and selective deposition of metallic films | Delphine Longrie, Antti Niskanen, Han Wang, Qi Xie, Jan Willem Maes +4 more | 2018-08-07 |
| 10014212 | Selective deposition of metallic films | Shang Chen, Toshiharu Watarai, Takahiro Onuma, Dai Ishikawa | 2018-07-03 |
| 9899291 | Method for protecting layer by forming hydrocarbon-based extremely thin film | Richika Kato, Seiji Okuro, Yuya Nonaka, Akinori Nakano | 2018-02-20 |
| 9875893 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2018-01-23 |
| 9805974 | Selective deposition of metallic films | Shang Chen, Toshiharu Watarai, Takahiro Onuma, Dai Ishikawa | 2017-10-31 |
| 9803277 | Reaction chamber passivation and selective deposition of metallic films | Delphine Longrie, Antti Niskanen, Han Wang, Qi Xie, Jan Willem Maes +4 more | 2017-10-31 |
| 9607837 | Method for forming silicon oxide cap layer for solid state diffusion process | — | 2017-03-28 |
| 9576790 | Deposition of boron and carbon containing materials | Viljami Pore, Yosuke Kimura, Wataru Adachi, Hideaki Fukuda, Werner Knaepen +2 more | 2017-02-21 |
| 9564314 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2017-02-07 |
| 9464352 | Low-oxidation plasma-assisted process | Ryu Nakano, Naoki Inoue | 2016-10-11 |
| 9368352 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2016-06-14 |
| 9153441 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2015-10-06 |
| 8679958 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Suvi Haukka +1 more | 2014-03-25 |
| 8669185 | Method of tailoring conformality of Si-containing film | Shigeyuki Onizawa, Woo Jin Lee, Hideaki Fukuda | 2014-03-11 |
| 8394466 | Method of forming conformal film having si-N bonds on high-aspect ratio pattern | Kuo-wei Hong, Akira Shimizu, Woo Jin Lee | 2013-03-12 |
| 8133555 | Method for forming metal film by ALD using beta-diketone metal complex | Hiroshi Shinriki, Daekyun Jeong | 2012-03-13 |