HS

Hiroshi Shinriki

TL Tokyo Electron Limited: 24 patents #199 of 5,567Top 4%
KS Kawasaki Steel: 10 patents #78 of 1,922Top 5%
AK Asm Japan K.K.: 8 patents #17 of 128Top 15%
HI Hitachi: 6 patents #6,582 of 28,497Top 25%
NE Nec: 1 patents #7,889 of 14,502Top 55%
Overall (All Time): #58,864 of 4,157,543Top 2%
48
Patents All Time

Issued Patents All Time

Showing 1–25 of 48 patents

Patent #TitleCo-InventorsDate
8133555 Method for forming metal film by ALD using beta-diketone metal complex Kunitoshi Namba, Daekyun Jeong 2012-03-13
8084104 Atomic composition controlled ruthenium alloy film formed by plasma-enhanced atomic layer deposition Kunitoshi Namba, Daekyun Jeong 2011-12-27
7799674 Ruthenium alloy film for copper interconnects Hiroaki Inoue 2010-09-21
7785658 Method for forming metal wiring structure Akira Shimizu 2010-08-31
7655564 Method for forming Ta-Ru liner layer for Cu wiring Daekyun Jeong 2010-02-02
7497964 Plasma igniting method and substrate processing method Masanobu Igeta, Kazuyoshi Yamazaki, Shintaro Aoyama 2009-03-03
7481902 Substrate processing apparatus and method, high speed rotary valve and cleaning method Junichi Arami 2009-01-27
7435484 Ruthenium thin film-formed structure Hiroaki Inoue 2008-10-14
7408225 Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms Baiei Kawano, Akira Shimizu 2008-08-05
7383841 Method of cleaning substrate-processing device and substrate-processing device Kazuya Dobashi, Mikio Suzuki, Takashi Magara 2008-06-10
7378358 Method for forming insulating film on substrate, method for manufacturing semiconductor device and substrate-processing apparatus Masanobu Igeta, Shintaro Aoyama 2008-05-27
7354622 Method for forming thin film and apparatus for forming thin film Kenji Matsumoto, Toru Tatsumi 2008-04-08
7273526 Thin-film deposition apparatus Junichi Arami 2007-09-25
7129185 Substrate processing method and a computer readable storage medium storing a program for controlling same Shintaro Aoyama, Masanobu Igeta 2006-10-31
7125799 Method and device for processing substrate, and apparatus for manufacturing semiconductor device Shintaro Aoyama, Masanobu Igeta, Tsuyoshi Takahashi 2006-10-24
7105362 Method of forming dielectric film Tsuyoshi Takahashi, Kazumi Kubo 2006-09-12
7105101 Method of removing oxide film on a substrate with hydrogen and fluorine radicals Shintaro Aoyama 2006-09-12
7037560 Film forming method, and film modifying method Masahito Sugiura 2006-05-02
6953731 Fabrication process of a semiconductor device Kazumi Kubo 2005-10-11
6927112 Radical processing of a sub-nanometer insulation film Masanobu Igeta, Shintaro Aoyama, Tsuyoshi Takahashi 2005-08-09
6866882 Method of forming a thin film Kenji Matsumoto 2005-03-15
6866890 Method of forming a dielectric film Hideki Kiryu, Shintaro Aoyama, Tsuyoshi Takahashi 2005-03-15
6806211 Device and method for processing substrate Koji Homma 2004-10-19
6800139 Film deposition apparatus and method Kenji Matsumoto 2004-10-05
6756235 Metal oxide film formation method and apparatus Yijun Liu, Takashi Magara 2004-06-29