Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12172198 | Gas cluster processing device and gas cluster processing method | Takehiko Orii, Yukimasa Saito, Kunihiko Koike, Takehiko Senoo, Koichi Izumi +3 more | 2024-12-24 |
| 12165848 | Substrate processing method, substrate processing apparatus, and method for producing nanowire or nanosheet transistor | Kenichi Oyama, Shohei Yamauchi, Akitaka Shimizu | 2024-12-10 |
| 11865590 | Substrate cleaning method, processing container cleaning method, and substrate processing device | Kyoko Ikeda, Tsunenaga Nakashima, Kenji Sekiguchi, Shuuichi Nishikido, Masato Nakajo +1 more | 2024-01-09 |
| 11772138 | Processing apparatus and processing method, and gas cluster generating apparatus and gas cluster generating method | Chishio Koshimizu | 2023-10-03 |
| 11761075 | Substrate cleaning apparatus | Yukimasa Saito, Toshiki HINATA, Kyoko Ikeda, Shuji Moriya | 2023-09-19 |
| 11694872 | Pattern enhancement using a gas cluster ion beam | Hiromitsu Kambara, Masaru Nishino, Reo Kosaka, Matthew C. Gwinn, Luis Fernandez +3 more | 2023-07-04 |
| 11517943 | Cleaning method and substrate processing apparatus | Kyoko Ikeda | 2022-12-06 |
| 11504751 | Substrate cleaning method, processing container cleaning method, and substrate processing device | Kyoko Ikeda, Tsunenaga Nakashima, Kenji Sekiguchi, Shuuichi Nishikido, Masato Nakajo +1 more | 2022-11-22 |
| 11446714 | Processing apparatus and processing method, and gas cluster generating apparatus and gas cluster generating method | Chishio Koshimizu | 2022-09-20 |
| 11450506 | Pattern enhancement using a gas cluster ion beam | Hiromitsu Kambara, Masaru Nishino, Reo Kosaka, Matthew C. Gwinn, Luis Fernandez +3 more | 2022-09-20 |
| 11267021 | Gas cluster processing device and gas cluster processing method | Takehiko Orii, Yukimasa Saito, Kunihiko Koike, Takehiko Senoo, Koichi Izumi +3 more | 2022-03-08 |
| 10786837 | Method for cleaning chamber of substrate processing apparatus | Yukimasa Saito, Toshiki HINATA, Kyoko Ikeda, Shuji Moriya | 2020-09-29 |
| 10381233 | Method and apparatus for substrate processing | Koji Kagawa, Syuhei Yonezawa, Toshihide Takashima, Masaru Amai | 2019-08-13 |
| 10163622 | Substrate cleaning method, substrate processing method, substrate processing system and semiconductor device manufacturing method | Nobuyuki Takahashi, Tatsuya Suzuki | 2018-12-25 |
| 10049899 | Substrate cleaning apparatus | Kensuke Inai | 2018-08-14 |
| 9960056 | Substrate cleaning method, substrate cleaning apparatus and vacuum processing system | Kensuke Inai, Misako Saito | 2018-05-01 |
| 9881815 | Substrate cleaning method, substrate cleaning device, and vacuum processing device | Jiro Matsuo, Toshio Seki, Takaaki Aoki, Kensuke Inai, Misako Saito | 2018-01-30 |
| 9875915 | Method for removing metal contamination and apparatus for removing metal contamination | Yudai ITO, Misako Saito, Shigeyoshi Kojima, Hideki Nishimura | 2018-01-23 |
| 9837260 | Cleaning method, processing apparatus, and storage medium | Kensuke Inai | 2017-12-05 |
| 9214364 | Substrate cleaning apparatus and vacuum processing system | Kensuke Inai, Akitaka Shimizu, Kenta Yasuda, Yu Yoshino, Toshihiro Aida +1 more | 2015-12-15 |
| 9099298 | Substrate cleaning apparatus and substrate cleaning method | Takashi Fuse | 2015-08-04 |
| 8673086 | Method and device for cleaning a substrate and storage medium | Akitake Tamura, Akinobu Kakimoto | 2014-03-18 |
| 8574448 | Plasma generation method, cleaning method, and substrate processing method | Hiroshi Kannan, Noboru Tamura | 2013-11-05 |
| 8404590 | Plasma processing method and storage medium | Sung-Tae Lee | 2013-03-26 |
| 8268185 | Method for analyzing quartz member | Teruyuki Hayashi, Kohei Tsugita, Misako Saito | 2012-09-18 |